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247545

Sigma-Aldrich

Di-tert-butyl disulfide

97%

Synonym(s):

tert-Butyl disulfide

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About This Item

Linear Formula:
(CH3)3CSSC(CH3)3
CAS Number:
Molecular Weight:
178.36
Beilstein:
1698170
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

vapor density

5 (vs air)

vapor pressure

51.7 mmHg ( 37.7 °C)

Assay

97%

form

liquid

refractive index

n20/D 1.490 (lit.)

bp

200-201 °C (lit.)

density

0.923 g/mL at 25 °C (lit.)

SMILES string

CC(C)(C)SSC(C)(C)C

InChI

1S/C8H18S2/c1-7(2,3)9-10-8(4,5)6/h1-6H3

InChI key

BKCNDTDWDGQHSD-UHFFFAOYSA-N

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General description

Mechanism of the oxidation of di-tert-butyl disulfide in the presence of H2O2 catalyzed by bis(acetylacetonato)oxovanadium and a chiral Schiff-base ligand has been investigated.

Application

Di-tert-butyl disulfide has been used in the preparation of gold-supported thin film from symmetrical and mixed disulphide adsorbates.

Pictograms

Environment

Hazard Statements

Precautionary Statements

Hazard Classifications

Aquatic Chronic 2

Storage Class Code

10 - Combustible liquids

WGK

WGK 3

Flash Point(F)

143.6 °F - closed cup

Flash Point(C)

62 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

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Suzanne A Blum et al.
The Journal of organic chemistry, 68(1), 150-155 (2003-01-08)
The mechanism of the oxidation of di-tert-butyl disulfide (1) to the chiral thiosulfinate (2) by H(2)O(2) catalyzed by bis(acetylacetonato)oxovanadium and a chiral Schiff-base ligand (3) has been investigated. Techniques included (51)V NMR spectroscopy, solvent effects on reaction enantioselectivity, and the
Contact angle goniometry, ellipsometry, XPS, and TOF-SIMS analysis of gold-supported, mixed self-assembled monolayers formed from mixed dialkyl disulfides.
Offord DA, et al.
Langmuir, 10(3), 761-766 (1994)
Yoonsu Park et al.
Nanomaterials (Basel, Switzerland), 11(1) (2021-01-13)
Colloidal nanoparticles (NPs) have been recently spotlighted as building blocks for various nanostructured devices. Their collective properties have been exhibited by arranging them on a substrate to form assembled NPs. In particular, electrophoretic deposition (EPD) is an emerging fabrication method
Yang Liu et al.
ACS nano, 12(8), 7803-7811 (2018-07-10)
Heterogeneous copper sulfide based nanostructures have attracted intense attention based on their potential to combine the plasmonic properties of copper-deficient copper sulfides with properties of other semiconductors and metals. In general, copper sulfides are versatile platforms for production of other

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