化驗
95%
反應適用性
reagent type: catalyst
core: ruthenium
mp
>300 °C (lit.)
質量偏移
M+24
SMILES 字串
[Ru].F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.[2H]c1nc(c([2H])c([2H])c1[2H])-c2nc([2H])c([2H])c([2H])c2[2H].[2H]c3nc(c([2H])c([2H])c3[2H])-c4nc([2H])c([2H])c([2H])c4[2H].[2H]c5nc(c([2H])c([2H])c5[2H])-c6nc([2H])c([2H])c([2H])c6[2H]
InChI
1S/3C10H8N2.2F6P.Ru/c3*1-3-7-11-9(5-1)10-6-2-4-8-12-10;2*1-7(2,3,4,5)6;/h3*1-8H;;;/q;;;2*-1;+2/i3*1D,2D,3D,4D,5D,6D,7D,8D;;;
InChI 密鑰
KLDYQWXVZLHTKT-LUXBKWEBSA-N
一般說明
Fluorescent dye tris(2,2′-bipyridine)ruthenium has a high quenching coefficient k = 2.6%/oK.
應用
用于 OLED/传感器研究的高效三线态发射体。
The emitting layers can be used as dopants for host materials in organic light emitting diodes and metal organic frameworks used for sensing, storage and catalysis applications.
訊號詞
Warning
危險聲明
危險分類
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
標靶器官
Respiratory system
儲存類別代碼
11 - Combustible Solids
水污染物質分類(WGK)
WGK 3
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
Photophysical Characterization of a Ruthenium(II) Tris(2,2?-bipyridine)-Doped Zirconium UiO-67 Metal?Organic Framework.
Maza WA and Morris AJ
The Journal of Physical Chemistry C, 8803-8817 null
Photophysical Characterization of a Ruthenium(II) Tris(2,2?-bipyridine)-Doped Zirconium UiO-67 Metal?Organic Framework.
Maza WA and Morris AJ
The Journal of Physical Chemistry C null
Holographically patterned activation using photo-absorber induced neural?thermal stimulation
Farah N, et al.
Journal of Neural Engineering, 056004 null
Holographically patterned activation using photo-absorber induced neural?thermal stimulation
Farah N, et al.
Journal of Neural Engineering null
Hongki Kang et al.
ACS nano, 14(9), 11406-11419 (2020-09-05)
Thermoplasmonic effect-based neural stimulation has been suggested as an alternative optical neural stimulation technology without genetic modification. Integration of near-infrared light with plasmonic gold nanoparticles has been demonstrated as a neuromodulation tool on in vitro neuronal network models. In order
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