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化驗
95%
mp
73-75 °C (lit.)
官能基
carboxylic acid
SMILES 字串
CC1=CCC=CC1C(O)=O
InChI
1S/C8H10O2/c1-6-4-2-3-5-7(6)8(9)10/h3-5,7H,2H2,1H3,(H,9,10)
InChI 密鑰
GYUSHSKDGRZQOB-UHFFFAOYSA-N
一般說明
Reaction between benzophenone and 1,4-dihydro-2-methylbenzoic acid was studied by combination of steady-state photolysis, laser flash photolysis and photochemically induced dynamic nuclear polarization.
訊號詞
Warning
危險聲明
危險分類
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
標靶器官
Respiratory system
儲存類別代碼
11 - Combustible Solids
水污染物質分類(WGK)
WGK 3
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
Chemistry (Weinheim an der Bergstrasse, Germany), 17(36), 10089-10096 (2011-07-28)
A thorough mechanistic study has been performed on the reaction between benzophenone (BZP) and a series of 1,4-dienes, including 1,4-cyclohexadiene (CHD), 1,4-dihydro-2-methylbenzoic acid (MBA), 1,4-dihydro-1,2-dimethylbenzoic acid (DMBA) and linoleic acid (LA). A combination of steady-state photolysis, laser flash photolysis (LFP)
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