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09649

Sigma-Aldrich

5-Benzoyl-4-hydroxy-2-methoxybenzenesulfonic acid

≥97.0% (HPLC)

Synonym(s):

HMBS, Sulisobenzone

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About This Item

Empirical Formula (Hill Notation):
C14H12O6S
CAS Number:
Molecular Weight:
308.31
Beilstein:
2889165
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

Assay

≥97.0% (HPLC)

form

powder

impurities

≤10% water

SMILES string

COc1cc(O)c(cc1S(O)(=O)=O)C(=O)c2ccccc2

InChI

1S/C14H12O6S/c1-20-12-8-11(15)10(7-13(12)21(17,18)19)14(16)9-5-3-2-4-6-9/h2-8,15H,1H3,(H,17,18,19)

InChI key

CXVGEDCSTKKODG-UHFFFAOYSA-N

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Pictograms

Exclamation mark

Signal Word

Warning

Hazard Statements

Hazard Classifications

Aquatic Chronic 3 - Eye Irrit. 2 - Skin Irrit. 2

Storage Class Code

11 - Combustible Solids

WGK

WGK 1

Flash Point(F)

No data available

Flash Point(C)

No data available

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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B K Shoichet et al.
Science (New York, N.Y.), 259(5100), 1445-1450 (1993-03-05)
A molecular docking computer program (DOCK) was used to screen the Fine Chemical Directory, a database of commercially available compounds, for molecules that are complementary to thymidylate synthase (TS), a chemotherapeutic target. Besides retrieving the substrate and several known inhibitors
T Merion Hughes et al.
Contact dermatitis, 56(3), 153-156 (2007-02-14)
Chemical ultraviolet (UV) filters have, over the last few decades, been increasingly used not only in conventional sunscreen products but also in many cosmetics and toiletries. Allergic contact dermatitis as well as photoallergic contact dermatitis reactions have been well documented
N Negreira et al.
Analytica chimica acta, 743, 101-110 (2012-08-14)
The stability of the UV filter benzophenone-4 (BP-4) in free chlorine-containing water was investigated, for the first time, by liquid chromatography quadrupole time-of-flight mass spectrometry (LC-QqTOF-MS). High mass accuracy and resolution capabilities of this hybrid mass spectrometer were used for
Caroline Dayan et al.
Birth defects research. Part B, Developmental and reproductive toxicology, 101(3), 254-261 (2014-05-07)
Exposure to ethylene glycol monomethyl ether (EGME), a glycol ether compound found in numerous industrial products, or to its active metabolite, 2-methoxyacetic acid (2-MAA), increases the incidence of developmental defects. Using an in vitro limb bud culture system, we tested
S M Edwards et al.
Photodermatology, photoimmunology & photomedicine, 10(3), 111-117 (1994-06-01)
The ability to accurately predict the phototoxic potential of personal and skin care products remains a key element in assessing the safety of premarketed products. To find a reliable in vitro alternative test for photoirritancy, the European Commission and the

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