GF80276182
Tantalum
foil, 100x100mm, thickness 0.125mm, annealed, 99.9%
Synonym(s):
Tantalum, TA000424, Ta
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About This Item
Recommended Products
vapor pressure
<0.01 mmHg ( 537.2 °C)
Assay
99.9%
form
foil
autoignition temp.
572 °F
manufacturer/tradename
Goodfellow 802-761-82
resistivity
13.5 μΩ-cm, 20°C
size × thickness
100 x 100 mm × 0.125 mm
bp
5425 °C (lit.)
mp
2996 °C (lit.)
density
16.69 g/cm3 (lit.)
SMILES string
[Ta]
InChI
1S/Ta
InChI key
GUVRBAGPIYLISA-UHFFFAOYSA-N
General description
For updated SDS information please visit www.goodfellow.com.
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Radiation research, 165(3), 365-371 (2006-02-24)
Both thick and thin films of pGEMR-3Zf- plasmid DNA deposited on a tantalum foil were exposed to soft X rays (effective energy of 14.8 keV) for various times in air under a relative humidity of 45% (Gamma approximately 6, where
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Arthroplasty of the temporomandibular joint in children with interposition of tantalum foil.
The Journal of bone and joint surgery. American volume, 28, 603-606 (1946-07-01)
Tantalum foil used in closing antro-oral fistulas.
United States Armed Forces medical journal, 2(8), 1183-1186 (1951-08-01)
Nano letters, 10(3), 948-952 (2010-02-12)
Tantalum nitride (Ta3N5) has a band gap of approximately 2.07 eV, suitable for collecting more than 45% of the incident solar spectrum energy. We describe a simple method for scale fabrication of highly oriented Ta3N5 nanotube array films, by anodization
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