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GF80276182

Tantalum

foil, 100x100mm, thickness 0.125mm, annealed, 99.9%

Synonym(s):

Tantalum, TA000424, Ta

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
Molecular Weight:
180.95
MDL number:
UNSPSC Code:
12141741
PubChem Substance ID:
NACRES:
NA.23

vapor pressure

<0.01 mmHg ( 537.2 °C)

Assay

99.9%

form

foil

autoignition temp.

572 °F

manufacturer/tradename

Goodfellow 802-761-82

resistivity

13.5 μΩ-cm, 20°C

size × thickness

100 x 100 mm × 0.125 mm

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

General description

For updated SDS information please visit www.goodfellow.com.

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Zhongli Cai et al.
Radiation research, 165(3), 365-371 (2006-02-24)
Both thick and thin films of pGEMR-3Zf- plasmid DNA deposited on a tantalum foil were exposed to soft X rays (effective energy of 14.8 keV) for various times in air under a relative humidity of 45% (Gamma approximately 6, where
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Arthroplasty of the temporomandibular joint in children with interposition of tantalum foil.
G W N EGGERS
The Journal of bone and joint surgery. American volume, 28, 603-606 (1946-07-01)
Tantalum foil used in closing antro-oral fistulas.
E J McCLUNG et al.
United States Armed Forces medical journal, 2(8), 1183-1186 (1951-08-01)
Xinjian Feng et al.
Nano letters, 10(3), 948-952 (2010-02-12)
Tantalum nitride (Ta3N5) has a band gap of approximately 2.07 eV, suitable for collecting more than 45% of the incident solar spectrum energy. We describe a simple method for scale fabrication of highly oriented Ta3N5 nanotube array films, by anodization

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