Skip to Content
Merck
All Photos(2)

Documents

669008

Sigma-Aldrich

Tetrakis(dimethylamido)titanium(IV)

packaged for use in deposition systems

Synonym(s):

TDMAT, Tetrakis(dimethylamino)titanium(IV)

Sign Into View Organizational & Contract Pricing


About This Item

Linear Formula:
[(CH3)2N]4Ti
CAS Number:
Molecular Weight:
224.17
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

Assay

99.999% (trace metals analysis)

form

liquid

reaction suitability

core: titanium

bp

50 °C/0.5 mmHg (lit.)

density

0.947 g/mL at 25 °C (lit.)

SMILES string

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

MNWRORMXBIWXCI-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Atomic number of base material: 22 Titanium

Application

The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

Pictograms

FlameCorrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

Supplementary Hazards

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

-22.0 °F - closed cup

Flash Point(C)

-30 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Journal of Applied Physics, 102, 083521/1-083521/1 (2007)
Mikami K, et al. et al.
Science of Synthesis: Houben-Weyl Methods of Molecular Transformations, 2, 494-494 (2014)
Matthew T McDowell et al.
ACS applied materials & interfaces, 7(28), 15189-15199 (2015-06-18)
Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) onto various n-type semiconductors (Si, GaAs, GaP

Articles

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Continuous efficiency improvements in photovoltaic devices result from material advancements and manufacturing innovation.

Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand.

See All

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service