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vapor density
>1 (vs air)
Quality Level
Assay
≥98%
form
liquid
refractive index
n20/D 1.377 (lit.)
bp
101 °C (lit.)
101 °C
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
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General description
Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.
Application
Hexamethyldisiloxane can be used:
- To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
- To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 2
Flash Point(F)
21.2 °F - closed cup
Flash Point(C)
-6 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge.
Journal of Physics D: Applied Physics, 28(8), 1661-1661 (1995)
Ion chemistries in hexamethyldisiloxane.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 23(5), 1295-1304 (2005)
The crystal and molecular structures of disiloxane (at 108 K) and hexamethyldisiloxane (at 148 K).
Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials, 35(9), 2093-2099 (1979)
The Raman Spectra of Hexamethyldisilane and Hexamethyldisiloxane.
J. Chem. Phys. , 21(5), 945-945 (1953)
The Journal of organic chemistry, 67(18), 6461-6473 (2002-08-31)
The combination of P4S10 and hexamethyldisiloxane efficiently converts esters, lactones, amides, lactams, and ketones to their corresponding thiono derivatives. In the presence of elemental sulfur, 3-oxoesters are converted to dithiolethiones by this reagent. Yields are comparable to or superior to
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