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335355

Sigma-Aldrich

Coronene

purified by sublimation, 99%

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About This Item

Empirical Formula (Hill Notation):
C24H12
CAS Number:
Molecular Weight:
300.35
Beilstein:
658468
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

Quality Level

Assay

99%

purified by

sublimation

bp

525 °C (lit.)

mp

428 °C (lit.)

SMILES string

c1cc2ccc3ccc4ccc5ccc6ccc1c7c2c3c4c5c67

InChI

1S/C24H12/c1-2-14-5-6-16-9-11-18-12-10-17-8-7-15-4-3-13(1)19-20(14)22(16)24(18)23(17)21(15)19/h1-12H

InChI key

VPUGDVKSAQVFFS-UHFFFAOYSA-N

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Application

An n-channel organic semiconductor.
Used to synthesize MBE-grown layered superconductors.

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

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Jpn J. App. Phys., Part I, 34, 3837-3845 (1995)
Long Chen et al.
Journal of the American Chemical Society, 134(43), 17869-17872 (2012-10-16)
Here we report hexathienocoronenes (HTCs), fully thiophene-annelated coronenes in which six double bonds in the periphery are thieno-fused. The derivatives tetrasubstituted with hexyl and dodecyl chains show a phase formation that strongly depends on the chain length. HTCs are remarkably
A versatile Fréchet-dendron compound unifies host-guest and templated heterogeneous self-assembly.
Kathrin Gruber et al.
Advanced materials (Deerfield Beach, Fla.), 23(19), 2195-2198 (2011-04-07)
Di Wu et al.
The Journal of organic chemistry, 77(24), 11319-11324 (2012-11-29)
The construction of coronenes using simple building blocks is a challenging task. In this work, triphenylene was used as a building block to construct functionalized coronenes, and their solid structures and optoelectronic properties were investigated. The single crystal structures showed
Anna M Hiszpanski et al.
ACS nano, 7(1), 294-300 (2012-12-12)
The structuring in organic electrically active thin films critically influences the performance of devices comprising them. Controlling film structure, however, remains challenging and generally requires stringent deposition conditions or modification of the substrate. To this end, we have developed post-deposition

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