Hydrofluoric acid (HF) is the 48% solution of HF in water. It is weakly acidic in nature. Aqueous HF is mostly used in etching silicon in semiconductors and producing inorganic fluoride compounds. HF can also be used as fluorinating and deprotecting agent. As fluorination agent it also forms complexes with organic bases.
Application
Hydrofluoric acid is used:
To compose the electrolyte for the synthesis of TiO2 nanotube arrays.
As etchant for the glass fibers.
As capping reagent for the synthesis of anatase TiO2 nanocrystals/nanosheets.
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