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496863

Sigma-Aldrich

Pentakis(dimethylamino)tantalum(V)

99.99%

Synonym(s):

PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide

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About This Item

Linear Formula:
Ta(N(CH3)2)5
CAS Number:
Molecular Weight:
401.33
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

assay

99.99%

form

solid

reaction suitability

core: tantalum
reagent type: catalyst

mp

100 °C (dec.) (lit.)

SMILES string

CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C

InChI

1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5

InChI key

VSLPMIMVDUOYFW-UHFFFAOYSA-N

General description

Atomic number of base material: 73 Tantalum

Features and Benefits

Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.

pictograms

FlameCorrosion

signalword

Danger

Hazard Classifications

Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1

Storage Class

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


Certificates of Analysis (COA)

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James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume

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