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296066

Sigma-Aldrich

Lithium dimethylamide

95%

Synonym(s):

Lithiodimethylamide

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10 G
$178.00
50 G
$576.00

About This Item

Linear Formula:
(CH3)2NLi
CAS Number:
3585-33-9
Molecular Weight:
51.02
Beilstein/REAXYS Number:
3618233
EC Number:
222-714-3
MDL number:
MFCD00008295
UNSPSC Code:
12352111
PubChem Substance ID:
24857832
NACRES:
NA.22

$178.00

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Quality Level

100

assay

95%

form

solid

functional group

amine

SMILES string

[Li]N(C)C

InChI

1S/C2H6N.Li/c1-3-2;/h1-2H3;/q-1;+1

InChI key

YDGSUPBDGKOGQT-UHFFFAOYSA-N

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Application

Lithium dimethylamide is used as a reagent in the synthesis of boron-nitrogen heterocycles[1] and 2,2′?diborabiphenyl.[2] It is a deprotecting agent which is employed in demethylation of bis(imino)pyridine ferrous dichloride for synthesizing ferrous amide-ate complexes.[3]

pictograms

FlameCorrosion
GHS02,GHS05

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Danger

Hazard Classifications

Pyr. Sol. 1 - Skin Corr. 1B - Water-react 2

Storage Class

4.2 - Pyrophoric and self-heating hazardous materials

wgk_germany

WGK 3

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

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Certificates of Analysis (COA)

Lot/Batch Number
SHBS0202
STBL2536
STBK9746
SHBQ0304
STBK6609

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2, 2′-Diborabiphenyl: A Lewis Acid Analogue of 2, 2′-Bipyridine.
Emslie DJH, et al.
Angewandte Chemie (International Edition in English), 115(11), 1290-1293 (2003)
Bis (imino) pyridine ligand deprotonation promoted by a transient iron amide.
Bouwkamp MW, et al.
Inorganic Chemistry, 45(1), 2-4 (2006)
Triphenylene analogues with B2N2C2 cores: synthesis, structure, redox behavior, and photophysical properties.
Jaska CA, et al.
Journal of the American Chemical Society, 128(33), 10885-10896 (2006)
Richard O'Donoghue et al.
Dalton transactions (Cambridge, England : 2003), 46(47), 16551-16561 (2017-11-22)
Herein we describe an efficient low temperature (60-160 °C) plasma enhanced atomic layer deposition (PEALD) process for gallium oxide (Ga
Lukas Mai et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 25(31), 7489-7500 (2019-03-15)
New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to the pyrophoric trimethylaluminium (TMA) which is to date a widely used Al precursor. Combining the high reactivity of aluminium alkyls employing the

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