553468
Tris(tert-butoxy)silanol
99.999%
Synonym(s):
TBS
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About This Item
Linear Formula:
((CH3)3CO)3SiOH
CAS Number:
Molecular Weight:
264.43
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23
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Assay
99.999%
form
solid
bp
205-210 °C (lit.)
mp
63-65 °C (lit.)
SMILES string
CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
InChI
1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
InChI key
HLDBBQREZCVBMA-UHFFFAOYSA-N
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General description
Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.
Application
Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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