767522

Tungsten

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

• Synonim(y): W
• Wzór empiryczny (zapis Hilla): W
• Numer CAS: 7440-33-7
• Masa cząsteczkowa: 183.84
• NACRES: NA.23
• PubChem Substance ID: 329767322
• UNSPSC Code: 12352103
• EC Number: 231-143-9
• MDL number: MFCD00011461

Właściwości

• assay: 99.95% trace metals basis
• form: pieces
• reaction suitability: core: tungsten
• resistivity: 4.9 μΩ-cm, 20°C
• diam. × thickness: 2.00 in. × 0.25 in.
• bp: 5660 °C (lit.)
• mp: 3410 °C (lit.)
• density: 19.3 g/mL at 25 °C (lit.)
• SMILES string: [W]
• InChI: 1S/W
• InChI key: WFKWXMTUELFFGS-UHFFFAOYSA-N

Opis

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

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Informacja o środkach bezpieczeństwa

• Klasa składowania: 11 - Combustible Solids
• wgk: nwg
• flash_point_f: Not applicable
• flash_point_c: Not applicable