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471593

Sigma-Aldrich

N,N-Diethylhydroxylamine

≥98%

Synonym(s):

N-Hydroxydiethylamine, DEHA, Diethylhydroxylamine

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About This Item

Linear Formula:
(CH3CH2)2NOH
CAS Number:
Molecular Weight:
89.14
Beilstein:
1731349
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

vapor density

3.07 (vs air)

vapor pressure

4 mmHg ( 0 °C)

Assay

≥98%

expl. lim.

10 %

refractive index

n20/D 1.420 (lit.)

bp

125-130 °C (lit.)

mp

−26-−25 °C (lit.)

density

0.867 g/mL at 25 °C (lit.)

SMILES string

CCN(O)CC

InChI

1S/C4H11NO/c1-3-5(6)4-2/h6H,3-4H2,1-2H3

InChI key

FVCOIAYSJZGECG-UHFFFAOYSA-N

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General description

N,N-Diethylhydroxylamine (diethylhydroxylamine, DEHA, (C2H5)2NOH) is a N,N-dialkylhydroxylamine. Its interaction with the surface of clean silicon(100)-2x1 has been studied by various theoretical and spectroscopic methods. H2O2 along with superoxide and diethylnitroxide radicals have been reported to be formed during the photochemical oxidation of DEHA.

Application

N,N-Diethylhydroxylamine may be employed as a ligand in the preparation of unsymmetric mixed ligand oxadiazoline and/or imine platinum complexes. It may be used in the synthesis of organometallic clusters of mixed hydrazide/hydroxylamide clusters of zinc.

Pictograms

FlameExclamation mark

Signal Word

Warning

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point(F)

113.0 °F - closed cup

Flash Point(C)

45 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Photochemistry and photobiology, 58(1), 11-18 (1993-07-01)
The photooxidation of N,N-diethylhydroxylamine (DEHA) by Rose Bengal (RB) has been investigated in micellar and nonmicellar aqueous solutions. We measured the quantum yield of oxygen consumption forming H2O2 and monitored two intermediates, the superoxide and diethylnitroxide radicals. When the pH
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Incorporating diversity into structures constructed from the organic modification of silicon surfaces requires the use of molecules that contain multiple substituents of different types. In this work we examine the possible dissociation pathways of diethylhydroxylamine (DEHA, (C(2)H(5))(2)NOH) on the surface

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