1.70338
Osmium ICP standard
(NH₄)₂OsCl₆ in HCl 7% 1000 mg/l Os Certipur®
Sinónimos:
Osmium Calibration Standard for ICP
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About This Item
Código UNSPSC:
41116107
NACRES:
NA.24
Productos recomendados
grado
certified reference material
Nivel de calidad
Línea del producto
Certipur®
concentración
1000 mg/L Os in 7% HCl
técnicas
ICP: suitable
densidad
1.034 g/cm3 at 20 °C
aplicaciones
industrial qc
pharmaceutical
Formato
single component solution
temp. de almacenamiento
15-25°C
Descripción general
This certified reference material (CRM) is produced in accordance with ISO 17034 and characterized in accordance with ISO/IEC 17025. This CRM is traceable to SI unit kg and measured against primary material from a National Metrology Institute (NMI), e.g. NIST.
Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.
Download your certificate at http://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.
Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.
Download your certificate at http://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.
Aplicación
The osmium ICP standard may find the below uses:
- To study the spatial distribution of isosteric osmium and ruthenium anticancer agents using laser ablation-inductively coupled plasma-mass spectrometry (LA-ICP-MS)
- Determination of osmium by inductively coupled plasma-mass spectrometry (ICP-MS) after pressure vessel digestion with nitric acid
- Development of a plasma induced vapor generation method to measure osmium in solutions by inductively coupled plasma-optical emission spectrometry (ICP-OES)
- Study of serum-binding properties of two metallodrugs by size exclusion chromatography-inductively coupled plasma-mass spectrometry (SEC-ICP-MS)
- Detection of osmium by Photochemical Vapor Generation-Inductively Coupled Plasma-Mass Spectrometry(PVG-ICP-MS)
- Inductively coupled plasma-optical emission spectrometric (ICP-OES) determination of osmium by using photooxidation vapor generation (POVG) method
Otras notas
For a complete product listing of our Certipur® range of CRMs for ICP and AAS, technical information, and example certificates please visit our ICP & AAS standards website
Información legal
CERTIPUR is a registered trademark of Merck KGaA, Darmstadt, Germany
Palabra de señalización
Warning
Frases de peligro
Consejos de prudencia
Clasificaciones de peligro
Met. Corr. 1
Código de clase de almacenamiento
8B - Non-combustible corrosive hazardous materials
Clase de riesgo para el agua (WGK)
WGK 2
Punto de inflamabilidad (°F)
Not applicable
Punto de inflamabilidad (°C)
Not applicable
Certificados de análisis (COA)
Busque Certificados de análisis (COA) introduciendo el número de lote del producto. Los números de lote se encuentran en la etiqueta del producto después de las palabras «Lot» o «Batch»
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Los clientes también vieron
Serum-binding properties of isosteric ruthenium and osmium anticancer agents elucidated by SEC-ICP-MS
Klose M, et al.
Monatshefte fur Chemie / Chemical Monthly, 149(10), 1719-1726 (2018)
Bioimaging of isosteric osmium and ruthenium anticancer agents by LA-ICP-MS
Klose M, et al.
Metallomics : Integrated Biometal Science, 10(3), 388-396 (2018)
High-efficiency photooxidation vapor generation of osmium for determination by inductively coupled plasma-optical emission spectrometry
Zhu Z, et al.
Journal of Analytical Atomic Spectrometry, 29(3), 506-511 (2014)
Pharmacopeial requirements for elemental impurities: a novel approach to the trace determination of osmium by oxidative pressure vessel sample digestion and measurement using inductively coupled plasma mass spectrometry (ICP-MS) after complexation and stabilisation
Venzago C, et al.
Journal of Analytical Atomic Spectrometry, 28(7), 1125-1129 (2013)
On line vapor generation of osmium based on solution cathode glow discharge for the determination by ICP-OES
Zhu Z, et al.
Talanta, 106, 133-136 (2013)
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