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Key Documents

749036

Sigma-Aldrich

Aluminum

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.9995% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
Al
CAS Number:
Molecular Weight:
26.98
EC Number:
MDL number:
UNSPSC Code:
12141702
PubChem Substance ID:
NACRES:
NA.23

Assay

99.9995% trace metals basis

form

pellets

autoignition temp.

1400 °F

reaction suitability

core: aluminum

resistivity

2.6548 μΩ-cm

diam. × thickness

3.00 in. × 0.125 in.

bp

2460 °C (lit.)

mp

660.37 °C (lit.)

density

2.7 g/mL at 25 °C (lit.)

SMILES string

[Al]

InChI

1S/Al

InChI key

XAGFODPZIPBFFR-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Pictograms

Flame

Signal Word

Danger

Hazard Statements

Hazard Classifications

Flam. Sol. 1 - Water-react 2

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable


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