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15747

Supelco

Silicon Standard for ICP

TraceCERT®, 1 g/L Si in NaOH (nominal concentration)

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About This Item

UNSPSC Code:
41116107
NACRES:
NA.24

grade

certified reference material
TraceCERT®

Quality Level

product line

TraceCERT®

concentration

1 g/L Si in NaOH (nominal concentration)

technique(s)

ICP: suitable

application(s)

industrial qc
pharmaceutical

format

single component solution

General description

This certified reference material (CRM) is produced in accordance with ISO 17034 and characterized in accordance with ISO/IEC 17025. This CRM is traceable to SI unit kg and measured against primary material from a National Metrology Institute (NMI), e.g. NIST.

Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.

Download your certificate at http://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.

Application

50 ng/g of Silicon standard may be used to improve maximum signal-to-background intensity ratios (SBR) during High-resolution inductively coupled plasma mass spectrometry (HR-ICP-MS).

Analysis Note

1 g/L Si in 2% sodium hydroxide, prepared with high purity Si, NaOH and water

Other Notes

For a complete product listing of our TraceCERT® range of CRMs for ICP and AAS, technical information, and example certificates please visit our ICP & AAS standards website

Legal Information

TraceCERT is a registered trademark of Merck KGaA, Darmstadt, Germany

Pictograms

Corrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B

Storage Class Code

8B - Non-combustible corrosive hazardous materials

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Trace-level determination and insight in speciation of silicon in petrochemical samples by flow-injection high resolution ICP MS and HPLC-high resolution ICP MS.
Pohl, Pawel, et al.
Journal of Analytical Atomic Spectrometry, 25.9, 1461-1466 (2010)

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