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T33200

Sigma-Aldrich

Thiosalicylic acid

97%

Synonym(s):

2-Sulfanylbenzoic acid, 2-Mercaptobenzoic acid

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About This Item

Linear Formula:
HSC6H4CO2H
CAS Number:
147-93-3
Molecular Weight:
154.19
Beilstein:
508507
EC Number:
205-704-3
MDL number:
MFCD00004836
UNSPSC Code:
12352100
PubChem Substance ID:
24900130
NACRES:
NA.22

Assay

97%

mp

162-165 °C (lit.)

SMILES string

OC(=O)c1ccccc1S

InChI

1S/C7H6O2S/c8-7(9)5-3-1-2-4-6(5)10/h1-4,10H,(H,8,9)

InChI key

NBOMNTLFRHMDEZ-UHFFFAOYSA-N

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Application

Thiosalicylic acid can be used as:
  • A nucleophilic trapping agent for the desulfenylation of 3-indolyl sulfides to obtain 3-unsubstituted indoles.
  • A starting material to prepare 2′-mercaptoacetophenone, which is used in the synthesis of thioflavanone by reacting with lithium diisopropylamide and benzaldehyde.
  • A stabilizing agent in the synthesis of metal nanoparticles.

It can also be used to prepare 2-thioxanthone-thioacetic acid bimolecular system, which is used as a photoinitiator for free radical polymerization.

Pictograms

Exclamation mark
GHS07

Signal Word

Warning

Hazard Statements

H315,H319,H335

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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One-Component Bimolecular Photoinitiating Systems, 2
Aydin M, et al.
Macromolecular Rapid Communications, 24(12), 718-723 (2003)
A new chemical method to desulfenylate indol-3-yl sulfides
Hamel P, et al.
Phosphorus, Sulfur, and Silicon and the Related Elements, 74(1-4), 391-391 (1993)
G Serrano et al.
Journal of the American Academy of Dermatology, 23(3 Pt 1), 479-483 (1990-09-01)
A photocontact dermatitis developed in three patients after the application of gel containing 0.5% piroxicam. Patch tests were positive to thiomersal and thiosalicylic acid. Photopatch tests with piroxicam at several concentrations were positive in the three patients but negative in
The Journal of Organic Chemistry, 59, 6372-6372 (1994)
K D Dobson et al.
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 56(3), 557-565 (2000-05-04)
In situ infrared spectroscopy has been used to investigate the adsorption of a range of simple aromatic carboxylic acids from aqueous solution to metal oxides. Thin films of TiO2, ZrO2, Al2O3 and Ta2O5 were prepared by evaporation of aqueous sols
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