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C87851

Sigma-Aldrich

Copper(II) acetylacetonate

97%

Synonym(s):

2,4-Pentanedione copper(II) derivative, Bis(2,4-pentanedionato)copper(II), Cu(acac)2, Cupric acetylacetonate

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About This Item

Linear Formula:
Cu(C5H7O2)2
CAS Number:
Molecular Weight:
261.76
Beilstein:
4157957
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

Assay

97%

form

powder

reaction suitability

core: copper
reagent type: catalyst

mp

284-288 °C (dec.) (lit.)

SMILES string

CC(=O)\C=C(\C)O[Cu]O\C(C)=C/C(C)=O

InChI

1S/2C5H8O2.Cu/c2*1-4(6)3-5(2)7;/h2*3,6H,1-2H3;/q;;+2/p-2/b2*4-3-;

InChI key

QYJPSWYYEKYVEJ-FDGPNNRMSA-L

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Application


  • Dextromethorphan as a moderator of reward deficiency: Research explored Dextromethorphan′s role in moderating reward deficiency associated with serotonin transporter availability in MDMA-treated animals, indicating its potential application in neuropsychopharmacology and addiction studies (Chiu et al., 2024).

  • Pharmacotherapies targeting GABA-Glutamate neurotransmission: A review discussed the use of Dextromethorphan among pharmacotherapies targeting GABA-glutamate neurotransmission for treatment-resistant depression, highlighting its role as an NMDA receptor antagonist and sigma-1 receptor agonist (Vecera et al., 2023).

  • Experience-dependent psychological effects: A double-blind study compared the psychological effects of Dextromethorphan and Psilocybin in healthy volunteers, examining their experience-dependent and enduring impacts, relevant in clinical psychology and psychedelic research (Mathai et al., 2023).

Pictograms

Exclamation mark

Signal Word

Warning

Hazard Statements

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

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The direct writing of plasmonic gold nanostructures by electron-beam-induced deposition.
Katja Höflich et al.
Advanced materials (Deerfield Beach, Fla.), 23(22-23), 2657-2661 (2011-05-04)
S S Arandjelovic et al.
Journal of B.U.ON. : official journal of the Balkan Union of Oncology, 14(2), 271-279 (2009-08-04)
To investigate the antitumor activity of two newly synthesized ruthenium(III) [Ru(III)] compounds carrying bidentate ligands: (acac)-acetylacetonate, [Ru(acac)3), and (tfac)-trifluoroacetylacetonate [Ru(tfac)3]. The activity of ruthenium(III) analogues was evaluated on HeLa, B16, and Femx cell lines for cytotoxicity in vitro using MTT
Gong-Jun Chen et al.
Dalton transactions (Cambridge, England : 2003), 39(44), 10637-10643 (2010-10-06)
Two Eu(III) complexes, [Eu(acac)(3)(dpq)] (1) and [Eu(acac)(3)(dppz)] CH(3)OH (2) {viz. acetylacetonate (acac), dipyrido[3,2-d:20,30-f]quinoxaline (dpq), dipyrido[3,2-a:20,30-c] phenazine (dppz)}, have been synthesized and their DNA binding, photo-induced DNA cleavage activity and cell cytotoxicity are studied. The complexes display significant binding propensity to
Gui-Ge Hou et al.
Chemical communications (Cambridge, England), 47(38), 10731-10733 (2011-08-27)
Two NbO-type MOFs based on ditopic pyridyl substituted diketonate ligands were reported. One exhibits a reversible SC-SC water encapsulation, while the other shows an interesting guest-driven luminescent property based on M(III) acetylacetonate (M = Eu and Fe) guest species.
Zhonglan Gao et al.
Journal of biological inorganic chemistry : JBIC : a publication of the Society of Biological Inorganic Chemistry, 16(5), 789-798 (2011-04-23)
Endoplasmic reticulum (ER) stress induced by free fatty acids (FFA) is important to β-cell loss during the development of type 2 diabetes. To test whether vanadium compounds could influence ER stress and the responses in their mechanism of antidiabetic effects

Articles

Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.

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