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About This Item
Empirical Formula (Hill Notation):
C
CAS Number:
Molecular Weight:
12.01
EC Number:
MDL number:
UNSPSC Code:
12352103
Recommended Products
form
monocrystalline powder
particle size
~1 μm
density
3.5 g/mL at 25 °C (lit.)
application(s)
battery manufacturing
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General description
Mono- and polycrystalline diamond can be prepared by high pressure high temperature (HPHT) and chemical vapor deposition (CVD).
Application
Monocrystalline diamond paste based electrodes may be used as electrochemical sensors for the determination of Fe (II) in pharmaceutical products.
Storage Class Code
13 - Non Combustible Solids
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Microwave plasma deposition and mechanical treatment of single crystals and polycrystalline diamond films
Ashkihazi EE, et al.
Inorganic Materials, 5(3), 230-236 (2014)
Monocrystalline Diamond Paste-Based Electrodes and Their Applications for the Determination of Fe(II) in Vitamin
Stefan RI and Bairu SG
Analytical Chemistry, 75(20), 5394-5398 (2003)
Brian McCall et al.
Optics express, 21(3), 3557-3572 (2013-03-14)
A novel method for fabricating lens arrays and other non-rotationally symmetric free-form optics is presented. This is a diamond machining technique using 4 controlled axes of motion - X, Y, Z, and C. As in 3-axis diamond micro-milling, a diamond
P Pereira Nogueira et al.
The Journal of clinical pediatric dentistry, 37(1), 53-57 (2013-01-25)
The aim of the present study was to evaluate hybrid layer thickness of primary molars sectioned with diamond, carbide and ultrasonic CVD burs. The occlusal enamel surfaces often molars were removed and superficial dentin was exposed. Three standardized cavities were
Pontus Forsberg et al.
Optics express, 21(3), 2693-2700 (2013-03-14)
Control of the sidewall angle of diamond microstructures was achieved by varying the gas mixture, bias power and mask shape during inductively coupled plasma etching. Different etch mechanisms were responsible for the angle of the lower and upper part of
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