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Merck

463922

Sigma-Aldrich

Ammonium metatungstate hydrate

99.99% trace metals basis

Sinónimos:

Ammonium tungsten oxide hydrate, Hexaammonium wolframate hydrate

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About This Item

Fórmula lineal:
(NH4)6H2W12O40 · xH2O
Número de CAS:
Peso molecular:
2956.30 (anhydrous basis)
EC Number:
MDL number:
UNSPSC Code:
12352302
PubChem Substance ID:
NACRES:
NA.23

assay

99.99% trace metals basis

form

powder

reaction suitability

reagent type: catalyst
core: tungsten

impurities

≤150.0 ppm Trace Metal Analysis

mp

100 °C (dec.) (lit.)

SMILES string

N.N.N.N.N.N.O.O[W]1O[W](O)(=O)(O1)O[W]2(=O)(=O)O[W](O)(=O)(O2)O[W]3(=O)(=O)O[W](O)(=O)(O3)O[W]4(=O)(=O)O[W](O)(=O)(O[W]5(=O)(=O)O[W](O)(=O)(O[W]6(=O)(=O)O[W](O)(O)O6)O5)O4

InChI

1S/6H3N.9H2O.32O.12W/h6*1H3;9*1H2;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;/q;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;;6*+1;+2/p-8

InChI key

ZBHPUDGBNLMJQH-UHFFFAOYSA-F

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General description

Ammonium metatungstate is a Keggin-type heteropoly compound. It can be prepared by polycondensation of ammonium tungstate solutions. It is widely used as a precursor for preparing tungsten catalysts for hydrocracking and as a fuel cell catalyst.

Application

Ammonium metatungstate can be used as a precursor to synthesize:
  • Carbon-supported tungsten catalyst for hydrogenolysis of cellulose.
  • Reduced tungsten and mixed tungsten oxide catalysts for bifunctional hydroisomerization of n-alkanes.
  • Hybrid 2D/3D tungsten diselenide transistors via chemical vapor deposition method.

pictograms

CorrosionExclamation mark

signalword

Danger

hcodes

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1

Storage Class

11 - Combustible Solids

wgk_germany

WGK 2

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

dust mask type N95 (US), Eyeshields, Gloves


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While a hexagonal WS2 monolayer, grown by chemical vapor deposition, exhibits distinctive patterns in photoluminescence mapping, segmented with alternating S-vacancy (SV) and W-vacancy (WV) domains in a single crystal, the formation mechanism for native alternating defect domains remains unresolved to
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