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247545

Sigma-Aldrich

Di-tert-butyl disulfide

97%

Sinónimos:

tert-Butyl disulfide

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About This Item

Fórmula lineal:
(CH3)3CSSC(CH3)3
Número de CAS:
110-06-5
Peso molecular:
178.36
Beilstein/REAXYS Number:
1698170
EC Number:
203-734-1
MDL number:
MFCD00008838
UNSPSC Code:
12352100
PubChem Substance ID:
24854874
NACRES:
NA.22

vapor density

5 (vs air)

vapor pressure

51.7 mmHg ( 37.7 °C)

assay

97%

form

liquid

refractive index

n20/D 1.490 (lit.)

bp

200-201 °C (lit.)

density

0.923 g/mL at 25 °C (lit.)

SMILES string

CC(C)(C)SSC(C)(C)C

InChI

1S/C8H18S2/c1-7(2,3)9-10-8(4,5)6/h1-6H3

InChI key

BKCNDTDWDGQHSD-UHFFFAOYSA-N

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General description

Mechanism of the oxidation of di-tert-butyl disulfide in the presence of H2O2 catalyzed by bis(acetylacetonato)oxovanadium and a chiral Schiff-base ligand has been investigated.

application

Di-tert-butyl disulfide has been used in the preparation of gold-supported thin film from symmetrical and mixed disulphide adsorbates.

pictograms

Environment
GHS09

hcodes

H411

Hazard Classifications

Aquatic Chronic 2

Storage Class

10 - Combustible liquids

wgk_germany

WGK 3

flash_point_f

143.6 °F - closed cup

flash_point_c

62 °C - closed cup

ppe

Eyeshields, Gloves, multi-purpose combination respirator cartridge (US)

Certificados de análisis (COA)

Busque Certificados de análisis (COA) introduciendo el número de lote del producto. Los números de lote se encuentran en la etiqueta del producto después de las palabras «Lot» o «Batch»

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Suzanne A Blum et al.
The Journal of organic chemistry, 68(1), 150-155 (2003-01-08)
The mechanism of the oxidation of di-tert-butyl disulfide (1) to the chiral thiosulfinate (2) by H(2)O(2) catalyzed by bis(acetylacetonato)oxovanadium and a chiral Schiff-base ligand (3) has been investigated. Techniques included (51)V NMR spectroscopy, solvent effects on reaction enantioselectivity, and the
Yoonsu Park et al.
Nanomaterials (Basel, Switzerland), 11(1) (2021-01-13)
Colloidal nanoparticles (NPs) have been recently spotlighted as building blocks for various nanostructured devices. Their collective properties have been exhibited by arranging them on a substrate to form assembled NPs. In particular, electrophoretic deposition (EPD) is an emerging fabrication method
Contact angle goniometry, ellipsometry, XPS, and TOF-SIMS analysis of gold-supported, mixed self-assembled monolayers formed from mixed dialkyl disulfides.
Offord DA, et al.
Langmuir, 10(3), 761-766 (1994)
Yang Liu et al.
ACS nano, 12(8), 7803-7811 (2018-07-10)
Heterogeneous copper sulfide based nanostructures have attracted intense attention based on their potential to combine the plasmonic properties of copper-deficient copper sulfides with properties of other semiconductors and metals. In general, copper sulfides are versatile platforms for production of other

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