化驗
≥95%
形狀
suspension
密度
0.9126
儲存溫度
2-8°C
SMILES 字串
NCCSC([Si](C)(C)C)[Si](C)(C)C
應用
其他說明
- Technology Spotlight: SLAP Reagents for Piperazine Synthesis
- Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
- Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
- Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis
相關產品
訊號詞
Danger
危險聲明
危險分類
Flam. Liq. 2
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
30.0 °F
閃點(°C)
-1.11 °C
实验方案
The expanding class of SLAP reagents provides access to saturated N-heterocycles and aliphatic aldehydes and ketones without additional reagents or the generation of toxic byproducts.
The expanding class of SLAP reagents provides access to saturated N-heterocycles and aliphatic aldehydes and ketones without additional reagents or the generation of toxic byproducts.
The expanding class of SLAP reagents provides access to saturated N-heterocycles and aliphatic aldehydes and ketones without additional reagents or the generation of toxic byproducts.
The expanding class of SLAP reagents provides access to saturated N-heterocycles and aliphatic aldehydes and ketones without additional reagents or the generation of toxic byproducts.
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