52630
Hexamethyldisiloxane
puriss., ≥98.5% (GC)
Synonym(s):
HMDSO
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About This Item
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vapor density
>1 (vs air)
Quality Level
grade
puriss.
Assay
≥98.5% (GC)
form
liquid
refractive index
n20/D 1.377 (lit.)
n20/D 1.377
bp
101 °C (lit.)
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
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General description
HMDSO(hexamethyldisiloxane) is an organosilicon compound. It is a non-toxic, environmentally friendly monomer. It can be used as a precursor to synthesize organosilicon thin films. It serves as a silylating agent for carboxylic acids and alcohols. Additionally, it is used in the preparation of aroyl chlorides. HMDSO is commonly used as a water-repellent.
Application
Hexamethyldisiloxane is used:
- As a modifying agent in the presence of ethanol/n-hexane solution for the preparation of hydrophobic and hydrophilic sodium silicate-based silica xerogels.
- To form the dielectric layers in the MIM(metal-insulator-metal) structure that is consisting of graphene quantum dots(GQDs) to prepare two-terminal NVM (non-volatile-memory) devices.
Features and Benefits
Hexamethyldisiloxanehas high thermal stability.
Other Notes
For a facile silylation of carboxylic acids; As chloride anion acceptor in the synthesis of sulphinic esters
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 2
Flash Point(F)
21.2 °F - closed cup
Flash Point(C)
-6 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Silylating Agents, 2nd ed. (1995)
Chemistry Letters (Jpn), 1753-1753 (1981)
Chemistry Letters (Jpn), 1475-1475 (1980)
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Nanoparticles composed of multiple silver cores and a plasma polymer shell (multicore@shell) were prepared in a single step with a gas aggregation cluster source operating with Ar/hexamethyldisiloxane mixtures and optionally oxygen. The size distribution of the metal inclusions as well
Materials (Basel, Switzerland), 14(2) (2021-01-10)
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