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Sigma-Aldrich

Trimethyl(methylcyclopentadienyl)platinum(IV)

packaged for use in deposition systems

Synonym(s):

MeCpPtMe3

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About This Item

Linear Formula:
C5H4CH3Pt(CH3)3
CAS Number:
Molecular Weight:
319.30
UNSPSC Code:
12352103
NACRES:
NA.23

Quality Level

form

low-melting solid

reaction suitability

core: platinum
reagent type: catalyst

mp

30-31 °C (lit.)

storage temp.

2-8°C

SMILES string

C[Pt](C)C.C[C]1[CH][CH][CH][CH]1

InChI

1S/C6H7.3CH3.Pt/c1-6-4-2-3-5-6;;;;/h2,4H,3H2,1H3;3*1H3;

InChI key

AGQKROMSWCHOND-UHFFFAOYSA-N

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General description

Trimethyl(methylcyclopentadienyl)platinum(IV) pale yellow or off-white crystalline organometallic complex widely used as a chemical vapor deposition/atomic layer deposition precursor to deposit platinum on various substrates.

Application

Trimethyl(methylcyclopentadienyl)platinum(IV) used:
  • As a precursor to prepare Pt nanoparticles. It helps in tuning the particle size for better activity and stability of the Pt catalyst.
  • To fabricate cathodes for solid acid fuel cells with high activity and excellent stability.
  • To prepare triple helical nanowires(THN) for advanced nanophotonics.
  • To fabricate Pt current collectors for electrodes of asymmetric V2O5–SnO2 nanopore battery.
  • As a precursor for synthesis of Platinum catalystwith high loadings of uniform-sized, 1−2 nm Ptnanoparticles on high surface area Al2O3, TiO2, and SrTiO3 supports. The synthesis ofcatalytic nanoparticles via ALD is a compelling technique for creatinginnovative and useful catalysts.
Precursors Packaged for Depositions Systems

Pictograms

Skull and crossbonesEnvironment

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 1 Oral - Acute Tox. 2 Dermal - Aquatic Acute 1 - Skin Sens. 1

Storage Class Code

6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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High performance asymmetric V2O5-SnO2 nanopore battery by atomic layer deposition
Chanyuan Liu, et al.
Nanoscale, 9, 11566-11573 (2017)
Triple-helical nanowires by tomographic rotatory growth for chiral photonics
Marco Esposito, et al.
Nature Communications, 6, 6484-6484 (2015)
Atomic layer deposition of Pt@CsH2PO4 for the cathodes of solid acid fuel cells
Dae-Kwang Lim, et al.
Electrochimica Acta, 288, 12-19 (2018)
Platinum atomic layer deposition on metal substrates: A surface chemistry study
Clinton Lien, et al.
Surface Science, 677, 161-166 (2018)
Genesis and evolution of surface species during Pt atomic layer deposition on oxide supports characterized by in situ XAFS analysis and water- gas shift reaction
Worajit Setthapun, et al.
The Journal of Physical Chemistry C, 114, 9758-9771 (2010)

Articles

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

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