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Key Documents

175552

Sigma-Aldrich

Trichlorosilane

99%

Synonym(s):

Hydrotrichlorosilane, Silicochloroform, Silicon chloride hydride, Trichloromonosilane

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About This Item

Linear Formula:
SiHCl3
CAS Number:
Molecular Weight:
135.45
EC Number:
MDL number:
UNSPSC Code:
12352101
PubChem Substance ID:
NACRES:
NA.22

vapor density

1 (vs air)

Quality Level

vapor pressure

9.75 psi ( 20 °C)

Assay

99%

form

liquid

expl. lim.

70 %

bp

32-34 °C (lit.)

density

1.342 g/mL at 25 °C (lit.)

storage temp.

2-8°C

SMILES string

Cl[SiH](Cl)Cl

InChI

1S/Cl3HSi/c1-4(2)3/h4H

InChI key

ZDHXKXAHOVTTAH-UHFFFAOYSA-N

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General description

Trichlorosilane is used as a reducing agent in certain chemical reactions or as a starting material for the synthesis of various organosilicon compounds. Trichlorosilane is generally used for the asymmetric hydrosilylation of olefins in the presence of palladium catalysts coordinated with chiral monodentate phosphorus ligands to generate chiral organosilanes.

Application

Trichlorosilane has been used to synthesize 11-dicyclohexylphosphino-12-phenyl-9,10-dihydro-9,10-ethenoanthracene (H-KITPHOS) via reduction of 11-dicyclohexylphosphinoyl-12-phenyl-9,10-dihydro-9,10-ethenoanthracene.
Other possible applications:
  • Asymmetric reduction of N-aryl ketimines in the presence of a novel

L-valine-derived catalyst to form secondary amines.
  • Hydrosilylation of imidazolinones to form chiral imidazolidinones in the presence of a 2,2′-bispyrrolidine based Lewis base organocatalyst.
  • Trichlorosilane activated with chiral N-formylproline

derivatives is an effective reagent for the reduction of imines to form
enantiomerically enriched amines.
  • Trichlorosilane reacts with dimethylformamide to form hypervalent hydridosilicates, which can reduce aldehydes to alcohols, imines to amines, and also for the reductive amination of aldehydes.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 1 - Skin Corr. 1A - Water-react 1

Supplementary Hazards

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 1

Flash Point(F)

<-2.2 °F - Equilibrium method

Flash Point(C)

< -19 °C - Equilibrium method

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Yaosi Fang et al.
Advanced science (Weinheim, Baden-Wurttemberg, Germany), 7(13), 2000310-2000310 (2020-07-17)
As an analogue to the vapor-liquid-solid process, the solution-liquid-solid (SLS) method offers a mild solution-phase route to colloidal 1D nanostructures with controlled sizes, compositions, and properties. However, direct growth of 1D nanostructure arrays through SLS processes remains in its infancy.
Christophe Blaszykowski et al.
Langmuir : the ACS journal of surfaces and colloids, 28(5), 2318-2322 (2012-01-25)
We report herein three unprecedented alkyltrichlorosilane surface modifiers bearing pentafluorophenyl ester (PFP), benzothiosulfonate (BTS), or novel β-propiolactone (BPL) functionalizable terminal groups. Evidence is provided that these molecules can be prepared in very high purity (as assessed by NMR) through a
First chemo-and stereoselective reduction of imines using trichlorosilane activated with N-formylpyrrolidine derivatives
Iwasaki F
Tetrahedron Letters, 42(13), 2525-2527 (2001)
New organic activators for the enantioselective reduction of aromatic imines with trichlorosilane
Onomura O
Tetrahedron Letters, 47(22), 3751-3754 (2006)
Naama Peor et al.
Journal of the American Chemical Society, 130(12), 4158-4165 (2008-03-05)
Electronic structures at the Si/SiO2/molecule interfaces were studied by Kelvin probe techniques (contact potential difference) and compared to theoretical values derived by the Helmholtz equation. Two parameters influencing the electronic properties of n-type <100> Si/SiO2 substrates were systematically tuned: the

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