730734
Trimethylgallium
packaged for use in deposition systems
Synonym(s):
Me3Ga, TMGa, TMG
About This Item
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Quality Level
form
liquid
reaction suitability
core: gallium
bp
92.5 °C/760 mmHg (lit.)
mp
-15.8 °C (lit.)
density
1.132 g/mL at 25 °C
SMILES string
C[Ga](C)C
InChI
1S/3CH3.Ga/h3*1H3;
InChI key
XCZXGTMEAKBVPV-UHFFFAOYSA-N
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Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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