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317004

Sigma-Aldrich

Tantalum(V) fluoride

98%

Synonym(s):

Tantalum pentafluoride

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About This Item

Linear Formula:
TaF5
CAS Number:
7783-71-3
Molecular Weight:
275.94
EC Number:
232-022-3
MDL number:
MFCD00042542
UNSPSC Code:
12352302
PubChem Substance ID:
24859058
NACRES:
NA.23

Quality Level

100

Assay

98%

form

powder

reaction suitability

reagent type: catalyst
core: tantalum

density

4.74 g/mL at 25 °C (lit.)

SMILES string

F[Ta](F)(F)(F)F

InChI

1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5

InChI key

YRGLXIVYESZPLQ-UHFFFAOYSA-I

General description

Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.

Application

Tantalum(V) fluoride can be used:
  • As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
  • As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
  • To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
  • As a catalyst for N-alkylation of arylamines with benzylalcohols.

Pictograms

Corrosion
GHS05

Signal Word

Danger

Hazard Statements

H314

Hazard Classifications

Eye Dam. 1 - Skin Corr. 1B

Storage Class Code

8B - Non-combustible corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)

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