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Sigma-Aldrich

Acetone

semiconductor grade VLSI PURANAL (Honeywell 17617)

Synonym(s):

Dimethyl ketone

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About This Item

Linear Formula:
CH3COCH3
CAS Number:
Molecular Weight:
58.08
Beilstein:
635680
EC Number:
MDL number:
UNSPSC Code:
12352115
eCl@ss:
39021201
PubChem Substance ID:

grade

semiconductor grade VLSI PURANAL (Honeywell 17617)

vapor density

2 (vs air)

vapor pressure

184 mmHg ( 20 °C)

form

liquid

CofA

specification on request

expl. lim.

13.2 %

color

clear colorless

refractive index

n20/D 1.359 (lit.)

bp

56 °C/760 mmHg (lit.)

mp

−94 °C (lit.)

density

0.791 g/mL at 25 °C (lit.)

format

neat

SMILES string

CC(C)=O

InChI

1S/C3H6O/c1-3(2)4/h1-2H3

InChI key

CSCPPACGZOOCGX-UHFFFAOYSA-N

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Application

Acetone′s luminesence intensity is dependent upon the solution components . The absorption of UV light by acetone, results in its photolysis and the production of radials .
Semiconductor grade acetone may be used for cleaning of the surfaces, such as;
  • Hydrogen terminated silicon wafer.
  • SiC wafers.
  • Chromium nitride epilayer on silicon wafer.

The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.

Legal Information

PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH

Pictograms

FlameExclamation mark

Signal Word

Danger

Hazard Statements

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 2 - STOT SE 3

Target Organs

Central nervous system

Supplementary Hazards

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point(F)

1.4 °F - closed cup

Flash Point(C)

-17.0 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Mono-fluorinated alkyne-derived SAMs on oxide-free Si (111) surfaces: preparation, characterization and tuning of the Si workfunction
Pujari S, et al.
Langmuir, 29(2), 570-580 (2013)
Covalently attached organic monolayers onto silicon carbide from 1-alkynes: molecular structure and tribological properties.
Pujari S, et al.
Langmuir, 29(13), 4019-4031 (2013)
Cu catalyzed oxidation of 5-hydroxymethylfurfural to 2, 5-diformylfuran and 2, 5-furandicarboxylic acid under benign reaction conditions.
Hansen T, et al.
Applied Catalysis A: General, 456, 44-50 (2013)
Hexadecadienyl monolayers on hydrogen-terminated Si (111): faster monolayer formation and improved surface coverage using the enyne moiety
Rijksen B, et al.
Langmuir, 28(16), 6577-6588 (2012)
Organic monolayers from 1-alkynes covalently attached to chromium nitride: alkyl and fluoroalkyl termination.
Pujari S, et al.
Langmuir, 29(33), 10393-10404 (2013)

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