Skip to Content
Merck
All Photos(3)

Key Documents

296066

Sigma-Aldrich

Lithium dimethylamide

95%

Synonym(s):

Lithiodimethylamide

Sign Into View Organizational & Contract Pricing


About This Item

Linear Formula:
(CH3)2NLi
CAS Number:
Molecular Weight:
51.02
Beilstein:
3618233
EC Number:
MDL number:
UNSPSC Code:
12352111
PubChem Substance ID:
NACRES:
NA.22

Quality Level

Assay

95%

form

solid

functional group

amine

SMILES string

[Li]N(C)C

InChI

1S/C2H6N.Li/c1-3-2;/h1-2H3;/q-1;+1

InChI key

YDGSUPBDGKOGQT-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

Application

Lithium dimethylamide is used as a reagent in the synthesis of boron-nitrogen heterocycles and 2,2′?diborabiphenyl. It is a deprotecting agent which is employed in demethylation of bis(imino)pyridine ferrous dichloride for synthesizing ferrous amide-ate complexes.

Pictograms

FlameCorrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Pyr. Sol. 1 - Skin Corr. 1B - Water-react 2

Storage Class Code

4.2 - Pyrophoric and self-heating hazardous materials

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Bis (imino) pyridine ligand deprotonation promoted by a transient iron amide.
Bouwkamp MW, et al.
Inorganic Chemistry, 45(1), 2-4 (2006)
2, 2′-Diborabiphenyl: A Lewis Acid Analogue of 2, 2′-Bipyridine.
Emslie DJH, et al.
Angewandte Chemie (International Edition in English), 115(11), 1290-1293 (2003)
Triphenylene analogues with B2N2C2 cores: synthesis, structure, redox behavior, and photophysical properties.
Jaska CA, et al.
Journal of the American Chemical Society, 128(33), 10885-10896 (2006)
Richard O'Donoghue et al.
Dalton transactions (Cambridge, England : 2003), 46(47), 16551-16561 (2017-11-22)
Herein we describe an efficient low temperature (60-160 °C) plasma enhanced atomic layer deposition (PEALD) process for gallium oxide (Ga
Lukas Mai et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 25(31), 7489-7500 (2019-03-15)
New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to the pyrophoric trimethylaluminium (TMA) which is to date a widely used Al precursor. Combining the high reactivity of aluminium alkyls employing the

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service