NIST2133
Phosphorus implant in silicon depth profile standard
NIST® SRM® 2133
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About This Item
UNSPSC Code:
41116107
NACRES:
NA.24
Pricing and availability is not currently available.
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grade
certified reference material
Quality Level
packaging
pkg of each
manufacturer/tradename
NIST®
application(s)
semiconductor
format
matrix material
General description
The SRM contains a single crystal silicon substrate measuring 1 cm × 1 cm, which is ion-implanted with the isotope 31P at a nominal energy of 100 keV.
SRM 2133_cert
SRM 2133_SDS
SRM 2133_cert
SRM 2133_SDS
Application
The SRM is intended to calibrate the secondary ion response for minor and trace concentrations of phosphorus within a silicon matrix using the secondary ion mass spectrometry (SIMS) method.
Features and Benefits
- Available with certificate documenting NIST-certified retained dose of 31P atoms which is obtained through radiochemical neutron activation analysis (RNAA).
- The NIST certificate is provided with expiration certificate, storage, handling, use, and maintenance instructions.
Other Notes
Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (31P)
Phosphorus (31P)
Legal Information
NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology
Storage Class Code
13 - Non Combustible Solids
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
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