730734
Trimethylgallium
packaged for use in deposition systems
Synonym(s):
Me3Ga, TMGa, TMG
About This Item
Recommended Products
form
liquid
reaction suitability
core: gallium
bp
92.5 °C/760 mmHg (lit.)
mp
-15.8 °C (lit.)
density
1.132 g/mL at 25 °C
SMILES string
C[Ga](C)C
InChI
1S/3CH3.Ga/h3*1H3;
InChI key
XCZXGTMEAKBVPV-UHFFFAOYSA-N
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General description
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
Supplementary Hazards
Storage Class Code
4.2 - Pyrophoric and self-heating hazardous materials
WGK
WGK 3
Certificates of Analysis (COA)
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Articles
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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