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Merck
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문서

469858

Sigma-Aldrich

Tetrakis(dimethylamido)titanium(IV)

99.999% trace metals basis

동의어(들):

TDMAT, Tetrakis(dimethylamino)titanium(IV)

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모든 사진(2)

About This Item

Linear Formula:
[(CH3)2N]4Ti
CAS Number:
3275-24-9
Molecular Weight:
224.17
EC Number:
221-904-3
MDL number:
MFCD00014861
UNSPSC 코드:
12352103
PubChem Substance ID:
24870618
NACRES:
NA.23

Quality Level

200

분석

99.999% trace metals basis

형태

liquid

반응 적합성

core: titanium

bp

50 °C/0.5 mmHg (lit.)

density

0.947 g/mL at 25 °C (lit.)

SMILES string

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

MNWRORMXBIWXCI-UHFFFAOYSA-N

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일반 설명

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애플리케이션

Tetrakis(dimethylamido)titanium(IV) (TDMAT) is a precursor to titanium nitride (TiN) thin films by organometallic chemical vapor deposition (OMCVD)and titanium dioxide thin films by atomic layer deposition (ALD).TDMAT undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

픽토그램

FlameCorrosion
GHS02,GHS05

신호어

Danger

유해 및 위험 성명서

H225,H260,H314

Hazard Classifications

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

보충제 위험성

EUH014

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point (°F)

-22.0 °F - closed cup

Flash Point (°C)

-30 °C - closed cup

개인 보호 장비

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

시험 성적서(COA)

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이미 열람한 고객

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Sigma-Aldrich

553131

Tetrakis(ethylmethylamido)zirconium(IV)

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Semiconductors of narrow bandgaps and high quantum efficiency have not been broadly utilized for photocatalytic coevolution of H2 and O2 via water splitting. One prominent issue is to develop effective protection strategies, which not only mitigate photocorrosion in an aqueous
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