463043

Disilane

electronic grade

• 동의어(들): Disilicane, Disilicoethane, Disilicon hexahydride, Silicoethane, Silicon hydride (Si₂ H₆ )
• Linear Formula: Si₂H₆
• CAS Number: 1590-87-0
• Molecular Weight: 62.22
• EC Number: 216-466-5
• MDL number: MFCD00054678
• UNSPSC 코드: 12352103
• PubChem Substance ID: 24869889
• NACRES: NA.23

속성

• Grade: electronic grade
• 분석: ≥99.998% chemical purity basis
• 형태: gas
• 불순물: ≤50 ppm Higher silanes; <0.2 ppm Chlorosilanes; <1 ppm Argon (Ar) + Oxygen (O₂); <1 ppm Carbon dioxide (CO₂); <1 ppm Nitrogen (N₂); <1 ppm THC; <1 ppm Water; <5 ppm Siloxanes
• bp: −14.5 °C (lit.)
• mp: −132.6 °C (lit.)
• 전이 온도: critical temperature 150.9 °C
• SMILES string: [SiH3][SiH3]
• InChI: 1S/H6Si2/c1-2/h1-2H3
• InChI key: PZPGRFITIJYNEJ-UHFFFAOYSA-N

설명

일반 설명

Atomic number of base material: 14 Silicon

애플리케이션

Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.

특징 및 장점

Disilane is used for the deposition of amorphous silicon, epitaxial silicon and silicon based dielectrics via rapid low-temperature chemical vapor depsition (LTCVD). Disilane is also used in the epitaxial growth of SiGe films by molecular beam epitaxy (MBE) in conjunction with solid sources of germanium. Precursor for the rapid, low temperature deposition of epitaxial silicon and silicon-based dielectrics.

안전성 정보

• 픽토그램: GHS02,GHS04,GHS08,GHS07
• 신호어: Danger
• 유해 및 위험 성명서: H221,H280,H312,H315,H319,H334,H335
• 예방조치 성명서: P210 - P280 - P302 + P352 + P312 - P305 + P351 + P338 - P403 + P233 - P410 + P403
• Hazard Classifications: Acute Tox. 4 Dermal - Eye Irrit. 2 - Flam. Gas 1B - Press. Gas Liquefied gas - Resp. Sens. 1 - Skin Irrit. 2 - STOT SE 3
• 표적 기관: Respiratory system
• Storage Class Code: 2A - Gases
• WGK: WGK 3
• Flash Point (°F): <50.0 °F - closed cup
• Flash Point (°C): < 10 °C - closed cup
• 개인 보호 장비: Eyeshields, Faceshields, Gloves, multi-purpose combination respirator cartridge (US)