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Merck
모든 사진(1)

문서

333395

Sigma-Aldrich

Dichlorosilane

≥99.99% trace metals basis

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About This Item

Linear Formula:
Cl2SiH2
CAS Number:
Molecular Weight:
101.01
EC Number:
MDL number:
UNSPSC 코드:
12352300
PubChem Substance ID:

vapor density

3.5 (vs air)

vapor pressure

1254 mmHg ( 20 °C)

설명

film resistivity > 50 Ω-cm

분석

≥99.99% trace metals basis

autoignition temp.

136 °F

expl. lim.

99 %

bp

8.3 °C (lit.)

mp

−122 °C (lit.)

SMILES string

Cl[SiH2]Cl

InChI

1S/Cl2H2Si/c1-3-2/h3H2

InChI key

MROCJMGDEKINLD-UHFFFAOYSA-N

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일반 설명

Dichlorosilane (DCS) is a halogenated silicon based precursor that facilitates the growth of a variety of silane based films such as silicon oxide, silicon nitride, silicon carbide, and epitaxial growth of silica.

애플리케이션

DCS is widely used in the synthesis of a variety of silicon-based materials, which find applications in the development of organic electronics based devices, including OFETs, MEMS, NEMS, MOSFETS, and lithium-ion batteries.

신호어

Danger

유해 및 위험 성명서

Hazard Classifications

Acute Tox. 2 Inhalation - Eye Dam. 1 - Flam. Gas 1 - Press. Gas Liquefied gas - Skin Corr. 1B

보충제 위험성

Storage Class Code

2A - Gases

WGK

WGK 1

Flash Point (°F)

-34.6 °F

Flash Point (°C)

-37 °C

개인 보호 장비

Faceshields, Gloves, Goggles, multi-purpose combination respirator cartridge (US)


시험 성적서(COA)

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문서 라이브러리 방문

J Komatsu et al.
Journal of biomolecular structure & dynamics, 22(3), 331-337 (2004-10-12)
This report shows a new DNA stretching method using migration of an ice-water interface. DNA molecules were stretched accompanying the migration of the solid-liquid interface and immobilized in frozen area. This simple method needs no chemical modification to keep DNA
T Chen et al.
Electrophoresis, 20(12), 2412-2419 (1999-09-28)
The feasibility of polymeric phases based on a silicone polymer backbone as pseudostationary phases for electrokinetic chromatography has been investigated. Silicone phases were studied because of the range of chemistries that could be developed based on these backbones, and because
Low pressure chemical vapor deposition of silicon carbide from dichlorosilane and acetylene.
Wang C and Tsai D
Materials Chemistry and Physics, 63(3), 196-201 (2000)
Stress control of polycrystalline 3C−SiC films in a large-scale LPCVD reactor using 1, 3-disilabutane and dichlorosilane as precursors.
Roper CS, et al.
Journal of Micromechanics and Microengineering, 16(12), 2736-2736 (2006)
Soujanya N Jampala et al.
Journal of agricultural and food chemistry, 53(9), 3618-3625 (2005-04-28)
The structure and rheological properties of xanthan gum (XG) modified in a cold plasma environment were investigated. XG was functionalized in a capacitively coupled 13.56-MHz radio frequency dichlorosilane (DS)-plasma conditions and, consecutively, in situ aminated by ethylenediamine. The surface structure

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