추천 제품
분석
96%
형태
liquid
refractive index
n20/D 1.475 (lit.)
bp
144-145.5 °C (lit.)
density
1.562 g/mL at 25 °C (lit.)
SMILES string
Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl
InChI
1S/Cl6Si2/c1-7(2,3)8(4,5)6
InChI key
LXEXBJXDGVGRAR-UHFFFAOYSA-N
유사한 제품을 찾으십니까? 방문 제품 비교 안내
일반 설명
Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.
애플리케이션
HCDS can be used in the fabrication of silica aerogels by chemical vapor deposition (CVD), which can be potentially used as encapsulating agents and thermal insulators. It can also be used to synthesize 1,1,1,2,2,2-hexaamino-disilanes using CVD, which forms silicon-based films for microelectronic-based applications.
HCDS may be used as a reducing agent. It may be combined with ammonia to form silicon nitride by chemical vapor deposition(CVD) technique.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Skin Corr. 1B
보충제 위험성
Storage Class Code
8A - Combustible corrosive hazardous materials
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
시험 성적서(COA)
제품의 로트/배치 번호를 입력하여 시험 성적서(COA)을 검색하십시오. 로트 및 배치 번호는 제품 라벨에 있는 ‘로트’ 또는 ‘배치’라는 용어 뒤에서 찾을 수 있습니다.
Enhancing mechanical properties of silica aerogels.
Journal of Non-Crystalline Solids, 357(19-20), 3435-3441 (2011)
Use of hexachlorodisilane as a reducing agent. Stereospecific deoxygenation of acyclic phosphine oxides.
Journal of the American Chemical Society, 91(25), 7012-7023 (1969)
Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory.
Journal of the Korean Ceramic Society, 54(5), 443-447 (2017)
Chemical vapor deposition of silicon films using hexachlorodisilane
MRS Proceedings, 77, 709-709 (1986)
Film Properties of Low?k Silicon Nitride Films Formed by Hexachlorodisilane and Ammonia.
Journal of the Electrochemical Society, 147(6), 2284-2289 (2000)
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