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Key Documents

326739

Sigma-Aldrich

Hexamethyldisiloxane

NMR grade, ≥99.5%

Synonym(s):

HMDSO

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About This Item

Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
Beilstein:
1736258
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22

grade

NMR grade

vapor density

>1 (vs air)

Assay

≥99.5%

form

liquid

technique(s)

NMR: suitable

refractive index

n20/D 1.377 (lit.)

bp

101 °C (lit.)

mp

−59 °C (lit.)

density

0.764 g/mL at 20 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](C)(C)C

InChI

1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

InChI key

UQEAIHBTYFGYIE-UHFFFAOYSA-N

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Pictograms

FlameEnvironment

Signal Word

Danger

Hazard Statements

Precautionary Statements

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 2

Flash Point(F)

21.2 °F - closed cup

Flash Point(C)

-6 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Vikram D Kodibagkar et al.
Frontiers in bioscience : a journal and virtual library, 13, 1371-1384 (2007-11-06)
Over the years many techniques have been devised for the measurement of tissue oxygenation (oximetry). Oximetry using polarographic needle electrodes has long been considered a gold standard. Nuclear Magnetic Resonance (NMR) based oximetry uses exogenously administered reporter molecules such as
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Biomedical materials (Bristol, England), 4(4), 045002-045002 (2009-06-16)
This study investigated the influence of surface wettability on competitive protein adsorption and the initial attachment of osteoblasts. A thin-film coating of hexamethyldisiloxane (HMDSO) and subsequent O(2)-plasma treatment was carried out on substrates with a mirror surface in order to
Yuan-Kai Cheng et al.
Journal of chromatography. A, 1220, 143-146 (2011-12-24)
The Hadamard transform-gas chromatography/mass spectrometry (HT-GC/MS) technique was successfully employed for the detection of hexamethyldisiloxane (HMDSO, C(6)H(18)OSi(2)) at the sub-nL/L level in a semiconductor wafer cleanroom. Indoor air samples were collected from the room, according to EPA Method TO-17 using

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