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267481

Sigma-Aldrich

Titanium

foil, thickness 0.25 mm, 99.99% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
Ti
CAS Number:
7440-32-6
Molecular Weight:
47.87
EC Number:
231-142-3
MDL number:
MFCD00011264
UNSPSC Code:
12141746
PubChem Substance ID:
24856227
NACRES:
NA.23

Quality Level

100

Assay

99.99% trace metals basis

form

foil

autoignition temp.

860 °F

resistivity

42.0 μΩ-cm, 20°C

thickness

0.25 mm

bp

3287 °C (lit.)

mp

1660 °C (lit.)

density

4.5 g/mL at 25 °C (lit.)

application(s)

battery manufacturing

SMILES string

[Ti]

InChI

1S/Ti

InChI key

RTAQQCXQSZGOHL-UHFFFAOYSA-N

General description

Ti has low thermal and electrical conductivity. It is highly corrosion-resistant and has a high strength to weight ratio. A few angstroms thick layer of titania on the surface of Ti products makes its corrosion resistant.5 Ti foils could be employed as a substrate to grow arrays of hematite nanorods by hydrothermal method. A study reports pressure less sintering of SiC pieces and single crystals to Ti foils at 1500oC.Ti foil may be applied as an interlayer, diffusion bonded during the self joining of Si3N4. Si3N4/Ti-foil/Si3N4.

Quantity

700 mg = 25 × 25 mm; 2.8 g = 50 × 50 mm

Storage Class Code

11 - Combustible Solids

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Large-Scale Porous Hematite Nanorod Arrays: Direct Growth on Titanium Foil and Reversible Lithium Storage.
Song Y et al.
The Journal of Physical Chemistry C, 114(49), 21158-21164 (2010)
Bonding mechanism between silicon carbide and thin foils of reactive metals
Morozumi S, et al.
J. Mater. Sci., 20(11), 3976-3982 (1985)
Joining of silicon nitride with a titanium foil interlayer
Lemus J and Drew RAL
Materials Science & Engineering. A, Structural Materials : Properties, Microstructure and Processing, 352, 169-178 (2003)
J H Kim et al.
Journal of nanoscience and nanotechnology, 13(7), 4601-4607 (2013-08-02)
Nanocytalline TiN films were deposited on non-alkali glass and Al substrates by reactive DC magnetron sputtering (DCMS) with an electromagnetic field system (EMF). The microstructure and corrosion resistance of the TiN-coated Al substrates were estimated by X-ray diffraction (XRD), scanning
Jinho Shin et al.
Journal of nanoscience and nanotechnology, 13(8), 5807-5810 (2013-07-26)
In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface
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