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  • High-contrast photopatterning of photoluminescence within quantum dot films through degradation of a charge-transfer quencher.

High-contrast photopatterning of photoluminescence within quantum dot films through degradation of a charge-transfer quencher.

Advanced materials (Deerfield Beach, Fla.) (2012-06-09)
Mario Tagliazucchi, Victor A Amin, Severin T Schneebeli, J Fraser Stoddart, Emily A Weiss
要旨

Diffraction-limited, high-contrast photopatterning of the photoluminescence of layer-by-layer films comprising CdSe@CdS@ZnS quantum dots and polyviologen is reported. The photoluminescence of the quantum dots is initially quantitatively quenched due to ultrafast photoinduced electron transfer to polyviologen. Photopatterning is achieved by high-power or prolonged illumination in air, which photochemically degrades the polyviologen and thereby restores the photoluminescence of the quantum dots.

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Sigma-Aldrich
ポリ(ジアリルジメチルアンモニウムクロリド) 溶液, average Mw 200,000-350,000 (medium molecular weight), 20 wt. % in H2O
Sigma-Aldrich
ポリ(ジアリルジメチルアンモニウムクロリド) 溶液, average Mw <100,000 (very low molecular weight), 35 wt. % in H2O
Sigma-Aldrich
ポリ(ジアリルジメチルアンモニウムクロリド) 溶液, 20 wt. % in H2O
Sigma-Aldrich
ポリ(ジアリルジメチルアンモニウムクロリド) 溶液, average Mw 400,000-500,000 (high molecular weight), 20 wt. % in H2O