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Merck

Synthesis of large-area MoS2 atomic layers with chemical vapor deposition.

Advanced materials (Deerfield Beach, Fla.) (2012-04-03)
Yi-Hsien Lee, Xin-Quan Zhang, Wenjing Zhang, Mu-Tung Chang, Cheng-Te Lin, Kai-Di Chang, Ya-Chu Yu, Jacob Tse-Wei Wang, Chia-Seng Chang, Lain-Jong Li, Tsung-Wu Lin
要旨

Large-area MoS(2) atomic layers are synthesized on SiO(2) substrates by chemical vapor deposition using MoO(3) and S powders as the reactants. Optical, microscopic and electrical measurements suggest that the synthetic process leads to the growth of MoS(2) monolayer. The TEM images verify that the synthesized MoS(2) sheets are highly crystalline.

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製品内容

Sigma-Aldrich
酸化モリブデン(VI), ACS reagent, ≥99.5%
Sigma-Aldrich
酸化モリブデン(VI), 99.97% trace metals basis
Sigma-Aldrich
硫化モリブデン(IV), powder
Sigma-Aldrich
酸化モリブデン(VI), ReagentPlus®, ≥99.5%
Sigma-Aldrich
硫化モリブデン(IV), powder, <2 μm, 98%
Sigma-Aldrich
酸化モリブデン(VI), nanopowder, 100 nm (TEM), 99.5% trace metals basis
Sigma-Aldrich
酸化モリブデン(VI), puriss. p.a., 99.5%