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725471
Bis(methyl-η5−cyclopentadienyl)methoxymethylzirconium
packaged for use in deposition systems
Synonym(s):
ZRCMMM, ZrD-CO4
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10 G
¥156,000
About This Item
Linear Formula:
Zr(CH3C5H4)2CH3OCH3
Molecular Weight:
295.53
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23
Recommended Products
form
liquid
reaction suitability
core: zirconium
color
colorless
bp
110 °C/0.5 mmHg (lit.)
density
1.27 g/mL±0.01 g/mL at 25 °C (lit.)
SMILES string
C[C]1[C][C][C][C]1.C[C]2[C][C][C][C]2.C[Zr]OC
InChI
1S/2C6H7.CH3O.CH3.Zr/c2*1-6-4-2-3-5-6;1-2;;/h2*2-5H,1H3;1H3;1H3;/q;;-1;;+1
InChI key
LFGIFPGCOXPKMG-UHFFFAOYSA-N
Related Categories
General description
Atomic number of base material: 40 Zirconium
Application
Advanced precursor for atomic layer deposition of ZrO2 thin films. Hafnium and zirconium oxides are leading candidates to replace silicion dioxide as the gate oxide in a variety of semiconductor and energy applications.[1] Excellent properties of HfO2 and ZrO2 films make them especially attractive for gate oxide replacement and as potential insulating dielectrics for capacitive elements in memory devices such as DRAM.[2]
Features and Benefits
Compatible with a variety of oxidants in ALD growth processes across a wide temperature range exhibiting self limiting growth up to 400 °C. Precursor volatility and thermal stability properties enable easy materials transport from bubblers into conventional deposition tools.
Packaging
Packaged in stainless steel cylinders compatible with conventional deposition systems. Precursors may be used in liquid injection systems as dilute solutions and in combination with a variety of other sources to deposit mixed oxides.
Signal Word
Warning
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 4 Oral - Eye Irrit. 2 - Skin Irrit. 2
Storage Class Code
10 - Combustible liquids not in Storage Class 3
WGK
WGK 3
Flash Point(F)
226.4 °F
Flash Point(C)
108 °C
Regulatory Listings
Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.
FSL
Group 4: Flammable liquids
Type 3 petroleums
Hazardous rank III
Water insoluble liquid
ISHL Indicated Name
Substances Subject to be Indicated Names
ISHL Notified Names
Substances Subject to be Notified Names
JAN Code
725471-VAR:
725471-10G:4548173353388
725471-BULK:
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J. W. Elama
Applied Physics Letters, 91, 253123-253123 (2007)
Gutsche, M.; Seidl, H.; Luetzen J.; Birner, A.;
International Electron Devices Meeting, 18-18 (2001)
High-k gate dielectrics: current status and material properties considerations
Wilk, G.D.; Wallace, R.M.; Anthony, J.M.
Journal of Applied Physics, 89, 5243-5243 (2001)
Articles
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
High Purity Metalorganic Precursors for CPV Device Fabrication
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
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