Typically, a volatile Ti compound such as Titanium(IV) isopropoxide (TTIP), TiCl4, Titanium alkoxides, Ti(acac)4, etc., can be used as the precursor for depositing thin films of TiO2 using a PECVD system. It's important to note that different precursors have different boiling points and may result in different surface structures and morphologies.
454516
Tetrakis(trimethylsilyloxy)silane
97%
Synonym(s):
1,1,1,5,5,5-Hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane, Tetrakis(trimethylsilyl) silicate
Sign Into View Organizational & Contract Pricing
All Photos(2)
Select a Size
Change View
5 ML
¥8,730
About This Item
Linear Formula:
[(CH3)3SiO]4Si
CAS Number:
Molecular Weight:
384.84
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22
Recommended Products
Quality Level
Assay
97%
refractive index
n20/D 1.389 (lit.)
bp
103-106 °C/2 mmHg (lit.)
density
0.87 g/mL at 25 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C
InChI
1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3
InChI key
VNRWTCZXQWOWIG-UHFFFAOYSA-N
Related Categories
Application
Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure.[1] TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.[2]
Signal Word
Warning
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
Target Organs
Respiratory system
Storage Class Code
10 - Combustible liquids
WGK
WGK 3
Flash Point(F)
168.8 °F - closed cup
Flash Point(C)
76 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Regulatory Listings
Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.
FSL
Group 4: Flammable liquids
Type 3 petroleums
Hazardous rank III
Water insoluble liquid
JAN Code
454516-VAR:
454516-BULK:
454516-25ML:
454516-5ML:
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Customers Also Viewed
Zichun Huang et al.
Water research, 185, 116224-116224 (2020-08-08)
Based on wastewater and raw/digested sludge samples from 29 wastewater treatment plants in 25 Chinese cities, the nationwide profiles of cis- and trans- isomers of phenylmethylsiloxanes (P3 and P4) and trifluoropropylmethylsiloxanes (D3F and D4F) were investigated. Calculated with paired influents/sludges
Liqin Zhi et al.
Journal of environmental sciences (China), 76, 199-207 (2018-12-12)
Methylsiloxanes are a class of silicone compounds that have been widely used in various industrial processes and personal care products for several decades. This study investigated the spatial distribution of three cyclic methylsiloxanes (D4-D6) and twelve linear methylsiloxanes (L5-L16) in
Liqin Zhi et al.
Environmental science & technology (2018-10-20)
Fluorinated methylsiloxanes are modified methylsiloxanes and include tris(trifluoropropyl)trimethylcyclotrisiloxane (D3F) and tetrakis(trifluoropropyl)tetramethylcyclotetrasiloxane (D4F). Here, we report fluorinated methylsiloxanes (D3F and D4F) in surface water and sediment samples collected near a fluorinated methylsiloxane manufacturing plant in Weihai, China. The concentrations of D3F
Characteristics of Plasma Polymerized Low-dielectric Constant SiCOH Films Deposited with Tetrakis (trimethylsilyloxy) silane and Cyclohexane Precursors
Kim H, et al.
Bulletin of the Korean Chemical Society,, 35(10), 2941-2944 (2014)
Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
Schafer, J, et al.
Surface and Coatings Technology, 295, 112-118 (2016)
-
What precursors can be suggested for compatibility with our PECVD system in order to deposit thin films of TiO2?
1 answer-
Helpful?
-
Active Filters
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service
