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Sigma-Aldrich

Bis(cyclopentadienyl)cobalt(II)

Synonym(s):

Cobaltocene

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About This Item

Linear Formula:
Co(C5H5)2
CAS Number:
Molecular Weight:
189.12
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

form

powder or crystals
solid

reaction suitability

core: cobalt

mp

176-180 °C (dec.) (lit.)

storage temp.

2-8°C

SMILES string

[Co].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2

InChI

1S/2C5H5.Co/c2*1-2-4-5-3-1;/h2*1-5H;

InChI key

PXFGMRZPRDJDEK-UHFFFAOYSA-N

General description

Bis(cyclopentadienyl)cobalt(II) also known as cobaltocene, is an organometalliccompound that is widely used in the field of polymer synthesis, cobaltnanomaterials, and redox flow batteries.

Application

Bis(cyclopentadienyl)cobalt(II) can be used:
  • As a dopant to prepare encapsulated carbon nanotubes with high thermoelectric conversion efficiency.
  • As a CVD precursor to fabricate cobalt oxide thin films for various applications.
  • As a redox-active anode species in Li-based redox flow batteries to achieve higher energy densities and energy efficiencies.
  • As a catalyst for controlled/“living” radical polymerization of methylmethacrylate.

Pictograms

FlameHealth hazard

Signal Word

Danger

Hazard Statements

Hazard Classifications

Carc. 2 - Flam. Sol. 2 - Muta. 2 - Resp. Sens. 1 - Skin Sens. 1

Storage Class Code

4.1B - Flammable solid hazardous materials

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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A high-performance all-metallocene-based, non-aqueous redox flow battery
Yu Ding, et al.
Energy & Environmental Science, 10, 491-497 (2017)
Development of n-type cobaltocene-encapsulated carbon nanotubes with remarkable thermoelectric property
Takahiro Fukumaru, et al.
Scientific Reports, 5, 7951-7951 (2015)
Jacob M Clary et al.
Nanotechnology, 31(17), 175703-175703 (2020-01-09)
Highly dispersed cobalt atoms were deposited on porous alumina particles using atomic layer deposition (ALD) with a CoCp2/H2 chemistry at approximately 7 wt%. H2 did not completely reduce the cyclopentadienyl organic ligands bound to deposited Co atoms at ALD reaction
Vincent C-C Wang et al.
Dalton transactions (Cambridge, England : 2003), 49(3), 858-865 (2019-12-20)
The development of oxygen-tolerant H2-evolving catalysts plays a vital role for a future H2 economy. For example, the [FeFe] hydrogenase enzymes are excellent catalyst for H2 evolution but rapidly become inactivated in the presence of O2. The mechanistic details of
Thin films of cobalt oxide deposited on high aspect ratio supports by atomic layer deposition
Madeleine Diskus, et al
Chem. Vap. Deposition, 17, 135-140 (2011)

Articles

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

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