GF64866202
Tantalum
foil, not light tested, 82x100mm, thickness 0.006mm, 99.9%
Synonym(s):
Tantalum, TA000260, Ta
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About This Item
vapor pressure
<0.01 mmHg ( 537.2 °C)
Assay
99.9%
form
foil
autoignition temp.
572 °F
manufacturer/tradename
Goodfellow 648-662-02
resistivity
13.5 μΩ-cm, 20°C
size × thickness
82x100 mm × 0.006 mm
bp
5425 °C (lit.)
mp
2996 °C (lit.)
density
16.69 g/cm3 (lit.)
SMILES string
[Ta]
InChI
1S/Ta
InChI key
GUVRBAGPIYLISA-UHFFFAOYSA-N
General description
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Nano letters, 10(3), 948-952 (2010-02-12)
Tantalum nitride (Ta3N5) has a band gap of approximately 2.07 eV, suitable for collecting more than 45% of the incident solar spectrum energy. We describe a simple method for scale fabrication of highly oriented Ta3N5 nanotube array films, by anodization
Isolation of the brachial segments of the spinal cord of the chick embryo by means of tantalum foil blocks.
The Journal of experimental zoology, 103(1), 113-142 (1946-10-01)
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Tantalum foil pegs.
American journal of ophthalmology, 34(3), 444-444 (1951-03-01)
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
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