GF24472616
Tantalum
foil, 50mm disks, thickness 0.075mm, annealed, 99.9%
Synonym(s):
Tantalum, TA000384, Ta
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About This Item
Empirical Formula (Hill Notation):
Ta
CAS Number:
Molecular Weight:
180.95
MDL number:
UNSPSC Code:
12141741
PubChem Substance ID:
NACRES:
NA.23
vapor pressure
<0.01 mmHg ( 537.2 °C)
Assay
99.90%
form
foil
autoignition temp.
572 °F
manufacturer/tradename
Goodfellow 244-726-16
resistivity
13.5 μΩ-cm, 20°C
diam. × thickness
50 mm × 0.075 mm
bp
5425 °C (lit.)
mp
2996 °C (lit.)
density
16.69 g/cm3 (lit.)
SMILES string
[Ta]
InChI
1S/Ta
InChI key
GUVRBAGPIYLISA-UHFFFAOYSA-N
General description
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Xinjian Feng et al.
Nano letters, 10(3), 948-952 (2010-02-12)
Tantalum nitride (Ta3N5) has a band gap of approximately 2.07 eV, suitable for collecting more than 45% of the incident solar spectrum energy. We describe a simple method for scale fabrication of highly oriented Ta3N5 nanotube array films, by anodization
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Tantalum foil pegs.
E MAXWELL
American journal of ophthalmology, 34(3), 444-444 (1951-03-01)
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
Tantalum foil cuffs in peripheral nerve surgery.
E E CLIFFTON
Surgery, 23(3), 507-514 (1948-03-01)
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