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767514

Sigma-Aldrich

Tantalum

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Synonym(s):

Ta

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
7440-25-7
Molecular Weight:
180.95
EC Number:
231-135-5
MDL number:
MFCD00011252
UNSPSC Code:
12352103
PubChem Substance ID:
329767321
NACRES:
NA.23

vapor pressure

<0.01 mmHg ( 537.2 °C)

Assay

99.95% trace metals basis

form

foil

autoignition temp.

572 °F

reaction suitability

core: tantalum

resistivity

13.5 μΩ-cm, 20°C

diam. × thickness

2.00 in. × 0.25 in.

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Storage Class Code

11 - Combustible Solids

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

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Kostantinidis; S.;
The European Physical Journal - Applied Physics, 56(2), 24002/1-24002/1 (2011)
Helmersson; U.;
Thin Solid Films, 513(1-2), 1-1 (2006)
Clinical use of porous tantalum in complex primary total knee arthroplasty.
Neil P Sheth et al.
American journal of orthopedics (Belle Mead, N.J.), 38(10), 526-530 (2009-12-17)
[Tantalum dust as a contrast substance for laryngography and bronchography (a review of the literature)].
R M Rabinovich
Vestnik rentgenologii i radiologii, (1)(1), 77-79 (1981-01-01)
Ulrich Dorn et al.
The Journal of arthroplasty, 29(4), 831-835 (2013-10-09)
This study compared the corrosion behavior of tantalum-coated cobalt-chromium modular necks with that of titanium alloy modular necks at their junction to titanium-alloy femoral stem. Tests were performed in a dry assembly and two wet assemblies, one contaminated with calf
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