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Sigma-Aldrich

Hexamethylcyclotrisiloxane

98%

Synonym(s):

Cyclic (D3) permethylsiloxane

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About This Item

Empirical Formula (Hill Notation):
C6H18O3Si3
CAS Number:
Molecular Weight:
222.46
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22

vapor density

1 (vs air)

Assay

98%

form

solid

bp

134 °C (lit.)

mp

50-64 °C (lit.)

SMILES string

C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1

InChI

1S/C6H18O3Si3/c1-10(2)7-11(3,4)9-12(5,6)8-10/h1-6H3

InChI key

HTDJPCNNEPUOOQ-UHFFFAOYSA-N

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Application

Hexamethylcyclotrisiloxane (D3) can be used in the synthesis of:
  • Polysiloxanes by anionic ring-opening polymerization.        
  • Thin films by pulsed- plasma-enhanced chemical vapor deposition (PECVD) for the application of insulating biomaterials.
  •  Dimethoxydimethylsilane by treating with dimethyl carbonate via deoligomerization using alkali metal hydroxide catalyst.

Pictograms

Flame

Signal Word

Danger

Hazard Statements

Precautionary Statements

Hazard Classifications

Flam. Sol. 1

Storage Class Code

4.1B - Flammable solid hazardous materials

WGK

WGK 3

Flash Point(F)

95.0 °F - closed cup

Flash Point(C)

35 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Anionic polymerization of hexamethylcyclotrisiloxane with acetylacetone initiator to form telechelic polymer
Kumar A and Eichinger BE
Macromolecules, 23(26), 5358-5358 (1990)
A S Chawla
Biomaterials, 2(2), 83-88 (1981-04-01)
Silicone coated Celgard-2400 and Silastic membranes were prepared by plasma polymerization of hexamethylcyclotrisiloxane. The adhesion of canine platelets and leucocytes was tested by passing whole blood from the anaesthetized mongrel dog in an ex-vivo shunt system. The silicone control Celgard
Living anionic polymerization of hexamethylcyclotrisiloxane (D3) using functionalized initiation.
Elkins C L and Long T E
Macromolecules, 37(17), 6657-6659 (2004)
Robust block copolymer mask for nanopatterning polymer films.
Chao C C, et al.
ACS Nano, 4(4), 2088-2094 (2010)
Elisabetta Finocchio et al.
Chemosphere, 72(11), 1659-1663 (2008-07-08)
The decomposition of hexamethylcyclotrisiloxane (HMCTS) has been studied at room temperature and in the range 473-673 K over the surface of basic (CaO, MgO) and acidic oxides (Al(2)O(3), SiO(2)). Alumina allows the complete removal of HMCTS from synthetic biogases at

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