Saltar al contenido
Merck
Todas las fotos(2)

Key Documents

View All Documentation

688509

Sigma-Aldrich

Tetracloruro de silicio

packaged for use in deposition systems

Sinónimos:

STC, Tetraclorosilano

Iniciar sesiónpara Ver la Fijación de precios por contrato y de la organización
Todas las fotos(2)

About This Item

Fórmula lineal:
SiCl4
Número de CAS:
10026-04-7
Peso molecular:
169.90
MDL number:
MFCD00011229
UNSPSC Code:
12352103
PubChem Substance ID:
329761169
NACRES:
NA.23

vapor density

5.86 (vs air)

Quality Level

100

vapor pressure

420 mmHg ( 37.7 °C)

assay

99.998% trace metals basis

form

liquid

reaction suitability

core: silicon

bp

57.6 °C (lit.)

mp

−70 °C (lit.)

density

1.483 g/mL at 25 °C (lit.)

SMILES string

Cl[Si](Cl)(Cl)Cl

InChI

1S/Cl4Si/c1-5(2,3)4

InChI key

FDNAPBUWERUEDA-UHFFFAOYSA-N

¿Está buscando productos similares? Visita Guía de comparación de productos

General description

Atomic number of base material: 14 Silicon

Application

Precursors Packaged for Depositions Systems

pictograms

Skull and crossbonesCorrosion
GHS06,GHS05

signalword

Danger

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

target_organs

Respiratory system

supp_hazards

EUH014,EUH071

Storage Class

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

wgk_germany

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Faceshields, Gloves, Goggles

Elija entre una de las versiones más recientes:

Certificados de análisis (COA)

Lot/Batch Number
SHBQ2687
SHBM7565
SHBK6266
SHBF7138V
06618LH

¿No ve la versión correcta?

Si necesita una versión concreta, puede buscar un certificado específico por el número de lote.

Busque por un COA

¿Ya tiene este producto?

Encuentre la documentación para los productos que ha comprado recientemente en la Biblioteca de documentos.

Visite la Librería de documentos

D Khushalani et al.
Journal of nanoscience and nanotechnology, 1(2), 129-132 (2003-08-14)
Mesostructured silica-nanoparticle monolithic composites have been synthesized by dispersing prefabricated nanoparticles of gold or zeolite (silicalite) in ethanolic reaction mixtures containing SiCl4 and a Pluronic triblock copolymer template. Whereas silicalite nanoparticles were used directly, surface functionalization of the gold nanoparticles
Pulmonary interstitial emphysema: CT findings.
A C Kemper et al.
AJR. American journal of roentgenology, 172(6), 1642-1642 (1999-06-01)
K M Sivanandaiah et al.
International journal of peptide and protein research, 45(4), 377-379 (1995-04-01)
Deprotection of the tert-butoxycarbonyl group during solid-phase synthesis of peptides can be conveniently and efficiently carried out using a neutral reagent, silicon tetrachloride/sodium iodide (iodotrichlorosilane). This simple and rapid method has been advantageously employed during the solid-phase synthesis of the
Claudio Curti et al.
Organic letters, 13(17), 4738-4741 (2011-08-13)
Virtually perfect transmittal of the enolate reactivity up to five conjugated double bonds from the origin allows a series of furan-based silyloxypolyenes to add to aldehyde carbonyls at the most distant point of the molecule. Denmark's axially chiral bisphosphoramide/SiCl(4) combination
T Kapias et al.
Journal of hazardous materials, 81(3), 209-222 (2001-02-13)
Silicon tetrachloride is a toxic, corrosive water reactive substance that is used widely in the process industries. On spillage from containment it creates liquid pools that can either boil or evaporate. The main feature of the pool behaviour is the
Ver todos los artículos relacionados

Artículos

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Ver todo

Nuestro equipo de científicos tiene experiencia en todas las áreas de investigación: Ciencias de la vida, Ciencia de los materiales, Síntesis química, Cromatografía, Analítica y muchas otras.

Póngase en contacto con el Servicio técnico