Saltar al contenido
Merck
Todas las fotos(1)

Key Documents

View All Documentation

654892

Sigma-Aldrich

Aldrich® Negative Photoresist Kit I

Iniciar sesiónpara Ver la Fijación de precios por contrato y de la organización
Todas las fotos(1)

About This Item

UNSPSC Code:
12352300
NACRES:
NA.23

storage temp.

2-8°C

Quality Level

100

Categorías relacionadas

General description

Aldrich® Negative Photoresist Kit I consists of materials for photolithography. The photoresist can be spin coated on the glass substrate for the formation of electrode arrays. The kit also provides masking and patterning on the glass surface.

Application

Aldrich® Negative Photoresist Kit I has been used in the fabrication of microelectrodes by photolithography. It can also be used to fabricate the droplet-based microfluidic device, microfluidic chips, glass optical waveguides, and integrated grating couplers.

Legal Information

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC

Los componentes del kit también están disponibles por separado

Referencia del producto
Descripción
SDS
  • 651761Negative resist remover I 250 mLSDS
  • 651788Negative resist developer I 250 mLSDS
  • 651796Negative photoresist I 100 mLSDS
  • 651974Negative resist thinner I 100 mLSDS

signalword

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3

target_organs

Central nervous system,Liver,Kidney, Respiratory system

Storage Class

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

flash_point_f

Not applicable

flash_point_c

Not applicable

Elija entre una de las versiones más recientes:

Certificados de análisis (COA)

Lot/Batch Number

Lo sentimos, en este momento no disponemos de COAs para este producto en línea.

Si necesita más asistencia, póngase en contacto con Atención al cliente

¿Ya tiene este producto?

Encuentre la documentación para los productos que ha comprado recientemente en la Biblioteca de documentos.

Visite la Librería de documentos

Los clientes también vieron

Slide 1 of 4

1 of 4

Chemat compact hotplate AC/DC input 220 V AC, European 2-pin plug

Z551600

Chemat compact hotplate

Chemat precision spin-coater AC/DC input 220 V AC, European 2-pin plug

Z551589

Chemat precision spin-coater

Silicon wafer (single side polished), <100>, N-type, contains no dopant, diam. × thickness 2 in. × 0.5 mm

Sigma-Aldrich

646687

Silicon

Polyisoprene, trans pellets, 99+% trans-1,4

Sigma-Aldrich

182168

Polyisoprene, trans

Jie-Bi Hu et al.
The Analyst, 140(5), 1495-1501 (2015-01-28)
Digital microfluidics (DMF) based on the electrowetting-on-dielectric phenomenon is a convenient way of handling microlitre-volume aliquots of solutions prior to analysis. Although it was shown to be compatible with on-line mass spectrometric detection, due to numerous technical obstacles, the implementation
Fabrication and characterization of optical waveguides and grating couplers
Sharpe JP, et al.
European Journal of Physics, 34(5), 1317-1317 (2013)
Fabrication and characterization of optical waveguides and grating couplers
J P Sharpe, et al.
European Journal of Physics, 34, 1317-1317 (2013)
High-speed droplet actuation on single-plate electrode arrays
Banerjee AN, et al.
Journal of Colloid and Interface Science, 362(2), 567-574 (2011)
Arghya Narayan Banerjee et al.
Journal of colloid and interface science, 362(2), 567-574 (2011-08-02)
This paper reports a droplet-based microfluidic device composed of patterned co-planar electrodes in an all-in-a-single-plate arrangement and coated with dielectric layers for electrowetting-on-dielectric (EWOD) actuation of discrete droplets. The co-planar arrangement is preferred over conventional two-plate electrowetting devices because it
Ver todos los artículos relacionados

Protocolos

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Nuestro equipo de científicos tiene experiencia en todas las áreas de investigación: Ciencias de la vida, Ciencia de los materiales, Síntesis química, Cromatografía, Analítica y muchas otras.

Póngase en contacto con el Servicio técnico