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Merck

A high-performance moisture sensor based on ultralarge graphene oxide.

Nanoscale (2015-10-13)
Boon-Hong Wee, Wai-Hwa Khoh, Ashis K Sarker, Chang-Hee Lee, Jong-Dal Hong
摘要

This article describes the effect of the lateral size of graphene oxide (GO) on the humidity sensing properties of a GO-based sensor. The GO size effect on the humidity sensing performance was evaluated on gold electrodes drop-coated with either an ultralarge graphene oxide (UGO) sheet (lateral size = 47.4 ± 22.2 μm) or a small-sized graphene oxide (SGO) sheet (lateral size = 0.8 ± 0.5 μm). The in-plane conductance obtained from the UGO and SGO electrodes was found to increase by four orders of magnitude and by three orders of magnitude, respectively, upon exposure to relative humidity RH change from 7 to 100%. The maximal sensitivity (S) values of the UGO and SGO humidity sensors were determined to be S(UGO) = 4339 ± 433 and SSGO = 1982 ± 122. The GO size clearly influenced the overall proton conductivity, as evidenced by the activation enthalpy (Ea) required for proton conduction in UGO and SGO sheets: Ea (UGO) = 0.63 eV, Ea (SGO) = 1.14 eV. The UGO humidity sensor exhibited an excellent device performance with a high sensitivity and an ultrafast response/recovery time (0.2/0.7 s). Good humidity sensing stability was observed, with a variation of only ±4.6% over five days. The resistive-type UGO humidity sensor was capable of sensing the moisture on a fingertip at a distance of 0.5 mm with a sensitivity of 17.4 and a response/recovery time of 0.6 s/1.3 s. The excellent device performance of the UGO humidity sensor also permitted the determination of the position of a fingertip by detecting the fingertip moisture, hence offering a great potential for touchless display position interface applications.

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Sigma-Aldrich
氢氧化铵 溶液, ACS reagent, 28.0-30.0% NH3 basis
Sigma-Aldrich
硝酸, ACS reagent, 70%
Sigma-Aldrich
氢氧化铵 溶液, 28% NH3 in H2O, ≥99.99% trace metals basis
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高锰酸钾, ACS reagent, ≥99.0%
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硝酸, 70%, purified by redistillation, ≥99.999% trace metals basis
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氢氧化铵 溶液, puriss., 30-33% NH3 in H2O
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硝酸, puriss. p.a., reag. ISO, reag. Ph. Eur., for determinations with dithizone, ≥65%
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硝酸, puriss. p.a., 65.0-67.0%
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氢氧化铵 溶液, puriss. p.a., reag. ISO, reag. Ph. Eur., ~25% NH3 basis
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高锰酸钾, ≤150 μm particle size, 97%
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硝酸, puriss. p.a., ≥65% (T)
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高锰酸钾, ACS reagent, ≥99.0%, low in mercury
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硝酸, red, fuming, HNO3 >90 %
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重铬酸钠 二水合物, ACS reagent, ≥99.5%
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氢氧化铵 溶液, puriss., meets analytical specification of Ph. Eur., 25-30% NH3 basis
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氢氧化铵 溶液, puriss. p.a. plus, ≥25% NH3 in H2O
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硝酸, ACS reagent, ≥90.0%
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高锰酸钾 溶液, 5 mM
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氯化锂 水合物, ≥99.99% trace metals basis
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高锰酸钾 溶液, 0.02 M
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硝酸, 1 M
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高锰酸钾 溶液, 2 mM
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硝酸, 0.1 M
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高锰酸钾 溶液, 0.1 M
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高锰酸钾 溶液, 0.2 M
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硝酸-14N 溶液, ~10 N in H2O, 99.99 atom % 14N
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高锰酸钾 溶液, 0.01 M
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硝酸, SAJ first grade, 65.0-66.0%, density: 1.40